SCHEMBL426341

SCHEMBL426341

CCCCC(OC)C(C)OCC(C)OCC(C)OCC(C)O

nearest known ligand 0.46

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.46
MAPT P10636 1/20 0.33
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL429420 1.00 TDP1 (0.46) TDP1MAPTHSD17B10
SCHEMBL429771 0.94 TDP1 (0.44) TDP1MAPTHSD17B10
SCHEMBL423768 0.94 TDP1 (0.44) TDP1MAPTHSD17B10
SCHEMBL432085 0.93 TDP1 (0.39) TDP1MAPTHSD17B10
SCHEMBL4314541 0.90 TDP1 (0.49) TDP1HSD17B10
SCHEMBL4321415 0.87 TDP1 (0.46) TDP1MAPTHSD17B10
SCHEMBL429521 0.87 MAPT (0.41) TDP1MAPTHSD17B10
SCHEMBL4317256 0.86 TDP1 (0.53) TDP1MAPTHSD17B10
SCHEMBL17654662 0.86 TDP1 (0.38) TDP1
SCHEMBL15387104 0.83 TDP1 (0.47) TDP1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12577401-B2 Curable resin composition, cured film formed therefrom, and electronic device having cured film SAMSUNG SDI CO., LTD. (KR) 2026-03-17 US disclosed
US-12252587-B2 Curable resin composition, thin film, and color conversion panel and display device including thin film SAMSUNG SDI CO., LTD. (KR) 2025-03-18 US disclosed
US-20240142874-A1 NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-05-02 US disclosed
CN-115551934-B Curable resin composition, cured film prepared therefrom, and electronic device comprising cured film 三星SDI株式会社 2024-03-12 CN disclosed
CN-115109413-B Curable resin composition, film, color conversion panel, and display device 三星SDI株式会社 2024-02-02 CN disclosed
US-20230279230-A1 CURABLE RESIN COMPOSITION, CURED FILM FORMED THEREFROM, AND ELECTRONIC DEVICE HAVING CURED FILM SAMSUNG SDI CO., LTD. (KR) 2023-09-07 US disclosed
CN-115551934-A Curable resin composition, cured film formed therefrom, and electronic device having cured film 三星SDI株式会社 2022-12-30 CN disclosed
US-20220306809-A1 CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AND DISPLAY DEVICE INCLUDING THIN FILM SAMSUNG SDI CO., LTD. (KR) 2022-09-29 US disclosed
CN-115109413-A Curable resin composition, film, color conversion panel, and display device 三星SDI株式会社 2022-09-27 CN disclosed
US-20220179138-A1 WAVELENGTH CONVERSION MEMBER AND UTILIZATION THEREOF, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE SHOWA DENKO MATERIALS CO., LTD. (JP) 2022-06-09 US disclosed
US-20120021190-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-01-26 US disclosed
US-20110256658-A1 METHOD FOR PRODUCING PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2011-10-20 US disclosed
US-20110195541-A1 COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL HITACHI CHEMICAL COMPANY, LTD. 2011-08-11 US disclosed
EP-2348546-A2 Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell Hitachi Chemical Co., Ltd. (JP) 2011-07-27 EP disclosed
US-20100102321-A1 RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-04-29 US disclosed
US-20090251652-A1 Silica based positive type photosensitive organic compound HITACHI CHEMICAL CO., LTD. 2009-10-08 US disclosed
US-20090214796-A1 Method for Forming Antireflection Film MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2009-08-27 US disclosed
US-20080260956-A1 Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part HITACHI CHEMICAL CO., LTD. (JP) 2008-10-23 US disclosed
EP-1890172-A1 METHOD FOR FORMING ANTIREFLECTION FILM Hitachi Chemical Co., Ltd. (JP) 2008-02-20 EP disclosed
EP-1829945-A1 FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART Hitachi Chemical Co., Ltd. (JP) 2007-09-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12577401-B2 Curable resin composition, cured film formed therefrom, and electronic device having cured film SEM1, CARM1, CAD TDP1 4014/4885MAPT 2391/4885HSD17B10 1011/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.