Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15387104 | 1.00 | TDP1 (0.47) | TDP1HSD17B10TSHR | |
| SCHEMBL310106 | 0.92 | TDP1 (0.39) | TDP1HSD17B10TSHR | |
| SCHEMBL4314541 | 0.86 | TDP1 (0.49) | TDP1HSD17B10 | |
| SCHEMBL429420 | 0.83 | TDP1 (0.46) | TDP1HSD17B10 | |
| SCHEMBL426341 | 0.83 | TDP1 (0.46) | TDP1HSD17B10 | |
| SCHEMBL429771 | 0.80 | TDP1 (0.44) | TDP1HSD17B10 | |
| SCHEMBL423768 | 0.80 | TDP1 (0.44) | TDP1HSD17B10 | |
| SCHEMBL7059595 | 0.79 | TDP1 (0.47) | TDP1HSD17B10 | |
| SCHEMBL17654662 | 0.78 | TDP1 (0.38) | TDP1 | |
| SCHEMBL12308430 | 0.78 | TDP1 (0.59) | TDP1HSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230249127-A1 | RATE ENHANCEMENT OF GAS CAPTURE PROCESSES | C-CAPTURE LTD (GB) | 2023-08-10 | — | — | US | claimed |
| EP-4182058-A1 | RATE ENHANCEMENT OF GAS CAPTURE PROCESSES | C-Capture Ltd. (GB) | 2023-05-24 | — | — | EP | claimed |
| CN-116154270-A | Non-aqueous electrolyte of sodium ion battery and sodium ion battery | 珠海市赛纬电子材料股份有限公司 | 2023-05-23 | — | — | CN | claimed |
| CN-115867372-A | Rate enhancement of gas capture process | 碳捕获有限公司 | 2023-03-28 | — | — | CN | claimed |
| WO-2022013550-A1 | RATE ENHANCEMENT OF GAS CAPTURE PROCESSES | C-CAPTURE LTD (GB) | 2022-01-20 | — | — | WO | claimed |
| EP-4012726-B1 | ADHESIVE CONDUCTIVE PASTE | DAICEL CORP (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-12152169-B2 | Adhesive conductive paste | DAICEL CORPORATION (JP) | 2024-11-26 | — | — | US | disclosed |
| WO-2024219382-A1 | LOW-TEMPERATURE-SINTERING BONDING MATERIAL AND BONDED STRUCTURE | 株式会社ダイセル | 2024-10-24 | — | — | WO | disclosed |
| US-20240142874-A1 | NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-05-02 | — | — | US | disclosed |
| CN-115109413-B | Curable resin composition, film, color conversion panel, and display device | 三星SDI株式会社 | 2024-02-02 | — | — | CN | disclosed |
| CN-117396566-A | Aqueous ink and ink set comprising same | DNP精细化工股份有限公司 | 2024-01-12 | — | — | CN | disclosed |
| CN-117396567-A | Pretreatment ink and ink set comprising the same | DNP精细化工股份有限公司 | 2024-01-12 | — | — | CN | disclosed |
| EP-2048196-A1 | CURABLE RESIN COMPOSITION AND METHOD FOR FORMING CURED COATING FILM | Daicel Chemical Industries, Ltd. (JP) | 2009-04-15 | — | — | EP | disclosed |
| CN-101398498-A | Coloring composite for color filter, color filter, and displaying device for color filter | FUJIFILM CORP (JP) | 2009-04-01 | — | — | CN | disclosed |
| CN-101194187-A | Method for forming antireflection film | HITACHI CHEMICAL CO LTD (JP) | 2008-06-04 | — | — | CN | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| CN-1698017-A | Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2005-11-16 | — | — | CN | disclosed |
| CN-1698018-A | Radiation-curable composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2005-11-16 | — | — | CN | disclosed |
| CN-1664707-A | Scouring agent and flushing fluid for the planography | DAICEL CHEM (JP) | 2005-09-07 | — | — | CN | disclosed |
| US-H1299-H | Developing negative photoresist with acid in solubilizing solvent | PPG INDUSTRIES, INC. (US) | 1994-04-05 | — | — | US | disclosed |