SCHEMBL424514

SCHEMBL424514

CCCCCCCCCC[SiH](C)N(C)[Si](C)(C)CCCCCCCCCC

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 3/20 0.32
TSHR P16473 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL423756 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL426518 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL28618334 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL11969452 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL1204402 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL28617592 0.98
SCHEMBL425379 0.88
SCHEMBL28791330 0.78
SCHEMBL4922190 0.74
SCHEMBL4927487 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107068540-A The cleaning method of chip 中央硝子株式会社 2017-08-18 CN claimed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
CN-103283004-A Wafer Cleaning Method CENTRAL GLASS CO LTD 2013-09-04 CN claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
CN-113165012-A Method for forming coating film of photocurable fluoropolyether elastomer composition 信越化学工业株式会社 2021-07-23 CN disclosed
CN-104176393-B Pressurized delivered container, the keeping method for having used it and liquid relief method 中央硝子株式会社 2018-03-16 CN disclosed
US-9748092-B2 Liquid chemical for forming protecting film CENTRAL GLASS COMPANY, LIMITED (JP) 2017-08-29 US disclosed
CN-107068540-A The cleaning method of chip 中央硝子株式会社 2017-08-18 CN disclosed
CN-103283004-B Wafer Cleaning Method 中央硝子株式会社 2017-04-12 CN disclosed
US-20170062203-A1 Method of Preparing Liquid Chemical for Forming Protective Film CENTRAL GLASS CO LTD (JP) 2017-03-02 US disclosed
US-20160148802-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS CO LTD (JP) 2016-05-26 US disclosed
US-9228120-B2 Liquid chemical for forming protecting film CENTRAL GLASS COMPANY, LIMITED (JP) 2016-01-05 US disclosed
CN-104176393-A PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER CENTRAL GLASS CO LTD 2014-12-03 CN disclosed
US-20140339321-A1 PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER CENTRAL GLASS COMPANY, LIMITED (JP) 2014-11-20 US disclosed
US-20140311379-A1 Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2014-10-23 US disclosed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US disclosed
US-20130255534-A1 Method of Preparing Liquid Chemical for Forming Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2013-10-03 US disclosed
CN-103283004-A Wafer Cleaning Method CENTRAL GLASS CO LTD 2013-09-04 CN disclosed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US disclosed
US-20120017934-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-26 US disclosed