⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28617592 | 0.90 | — | — | |
| SCHEMBL28618334 | 0.88 | DNM1 (0.32) | — | |
| SCHEMBL423756 | 0.88 | DNM1 (0.32) | — | |
| SCHEMBL1204402 | 0.88 | DNM1 (0.32) | — | |
| SCHEMBL424514 | 0.88 | DNM1 (0.32) | — | |
| SCHEMBL11969452 | 0.88 | DNM1 (0.32) | — | |
| SCHEMBL426518 | 0.88 | DNM1 (0.32) | — | |
| SCHEMBL2037640 | 0.78 | — | — | |
| SCHEMBL4922190 | 0.78 | — | — | |
| SCHEMBL4927487 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107068540-A | The cleaning method of chip | 中央硝子株式会社 | 2017-08-18 | — | — | CN | claimed |
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | claimed |
| CN-103283004-A | Wafer Cleaning Method | CENTRAL GLASS CO LTD | 2013-09-04 | — | — | CN | claimed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | claimed |
| WO-2012036445-A4 | CATALYST FOR SELECTIVE OXIDATIVE DESULFURIZATION AND PREPARATION METHOD THEREOF | 한국화학연구원 (KR) | 2012-08-09 | — | — | WO | claimed |
| US-20120164818-A1 | Process for Cleaning Wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | claimed |
| WO-2012036445-A2 | CATALYST FOR SELECTIVE OXIDATIVE DESULFURIZATION AND PREPARATION METHOD THEREOF | 한국화학연구원 (KR) | 2012-03-22 | — | — | WO | claimed |
| US-20240309214-A1 | METHOD FOR MANUFACTURING SURFACE-TREATED SOL-GEL SILICA PARTICLE, SURFACE-TREATED SOL-GEL SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-19 | — | — | US | disclosed |
| EP-4299518-A1 | SURFACE-TREATED SOL-GEL SILICA PARTICLE MANUFACTURING METHOD, SURFACE-TREATED SOL-GEL SILICA PARTICLES, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-03 | — | — | EP | disclosed |
| CN-116897139-A | Method for producing surface-treated sol-gel silica particles, and toner external additive for developing electrostatic images | 信越化学工业株式会社 | 2023-10-17 | — | — | CN | disclosed |
| WO-2022181018-A1 | SURFACE-TREATED SOL-GEL SILICA PARTICLE MANUFACTURING METHOD, SURFACE-TREATED SOL-GEL SILICA PARTICLES, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | 信越化学工業株式会社 | 2022-09-01 | — | — | WO | disclosed |
| US-11065354-B2 | Post-steam sterilization moisture-indicating articles | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2021-07-20 | — | — | US | disclosed |
| US-20190341246-A1 | Chemical Liquid for Forming Water Repellent Protective Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2019-11-07 | — | — | US | disclosed |
| CN-102934207-A | Chemical solution for forming protective film | CENTRAL GLASS CO LTD | 2013-02-13 | — | — | CN | disclosed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | disclosed |
| WO-2012036445-A4 | CATALYST FOR SELECTIVE OXIDATIVE DESULFURIZATION AND PREPARATION METHOD THEREOF | 한국화학연구원 (KR) | 2012-08-09 | — | — | WO | disclosed |
| US-20120164818-A1 | Process for Cleaning Wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | disclosed |
| WO-2012036445-A2 | CATALYST FOR SELECTIVE OXIDATIVE DESULFURIZATION AND PREPARATION METHOD THEREOF | 한국화학연구원 (KR) | 2012-03-22 | — | — | WO | disclosed |
| US-20120017934-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20110240931-A1 | NANOPARTICLE-RESIN COMPOSITION, NANOPARTICLE-RESIN COMPOSITE, AND METHOD OF MAKING NANOPARTICLE-RESIN COMPOSITE | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-10-06 | — | — | US | disclosed |