SCHEMBL426518

SCHEMBL426518

CCCCCC[SiH](C)N(C)[Si](C)(C)CCCCCC

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 3/20 0.32
TSHR P16473 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL423756 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL28618334 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL11969452 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL1204402 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL424514 1.00 DNM1 (0.32) DNM1TSHRTHRB
SCHEMBL28617592 0.98
SCHEMBL425379 0.88
SCHEMBL28791330 0.78
SCHEMBL4922190 0.74
SCHEMBL4927487 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107068540-A The cleaning method of chip 中央硝子株式会社 2017-08-18 CN claimed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
CN-103283004-A Wafer Cleaning Method CENTRAL GLASS CO LTD 2013-09-04 CN claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
US-20120164818-A1 Process for Cleaning Wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2012-06-28 US claimed
WO-2024236999-A1 CURABLE SILICONE COMPOSITION, CURED OBJECT FORMED FROM SAME, AND METHOD FOR PRODUCING SAME ダウ・東レ株式会社 2024-11-21 WO disclosed
US-20240309214-A1 METHOD FOR MANUFACTURING SURFACE-TREATED SOL-GEL SILICA PARTICLE, SURFACE-TREATED SOL-GEL SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-09-19 US disclosed
US-12037481-B2 Curable organopolysiloxane composition for forming films, and method for producing organopolysiloxane cured film DOW TORAY CO., LTD. (JP) 2024-07-16 US disclosed
EP-4397718-A1 GRANULAR CURABLE SILICONE COMPOSITION, CURED PRODUCT OF SAME, AND METHOD FOR PRODUCING SAME Dow Toray Co., Ltd. (JP) 2024-07-10 EP disclosed
EP-4397721-A1 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME Dow Toray Co., Ltd. (JP) 2024-07-10 EP disclosed
EP-4397720-A1 CURABLE SILICONE COMPOSITION, CURED OBJECT THEREFROM, AND METHOD FOR PRODUCING SAID CURED OBJECT Dow Toray Co., Ltd. (JP) 2024-07-10 EP disclosed
EP-3892687-B1 CURABLE ORGANOPOLYSILOXANE COMPOSITION FOR FORMING FILMS, AND METHOD FOR PRODUCING ORGANOPOLYSILOXANE CURED FILM DOW TORAY CO LTD (JP) 2024-06-26 EP disclosed
US-20140311379-A1 Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2014-10-23 US disclosed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US disclosed
US-20130255534-A1 Method of Preparing Liquid Chemical for Forming Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2013-10-03 US disclosed
CN-103283004-A Wafer Cleaning Method CENTRAL GLASS CO LTD 2013-09-04 CN disclosed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US disclosed
US-20120164818-A1 Process for Cleaning Wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2012-06-28 US disclosed
US-20120017934-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-26 US disclosed
US-6255373-B1 WATERPROOFING COATINGS DOW CORNING TORAY SILICONE COMPANY, LTD. (JP) 2001-07-03 US disclosed