SCHEMBL4247811

SCHEMBL4247811

CCOC(=O)C12C=CC(CC1)C2

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.33
SLC22A1 O15245 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
OPRD1 P41143 3/20 0.33
OPRK1 P41145 3/20 0.33
GRM1 Q13255 1/20 0.33
BLM P54132 1/20 0.33
PMP22 Q01453 1/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
TSHR P16473 1/20 0.33
NFKB1 P19838 1/20 0.33
CYP2C19 P33261 1/20 0.33
RECQL P46063 1/20 0.33
SLC6A4 P31645 1/20 0.33
ADRA1A P35348 1/20 0.33
KCNH2 Q12809 1/20 0.33
MEN1 O00255 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6161155 0.90 OPRM1 (0.35) OPRM1SLC22A1SMN1; SMN2OPRD1OPRK1
SCHEMBL1451329 0.88 PPM1B (0.31) PMP22CYP1A2CYP3A4CYP2C9TSHR
SCHEMBL7659505 0.87 ALDH1A1 (0.38) SLC22A1KDM4ECYP1A2CYP3A4TSHR
SCHEMBL10388300 0.87
SCHEMBL2350192 0.85 ALDH1A1 (0.36) SMN1; SMN2CYP1A2CYP3A4CYP2C9TSHR
SCHEMBL7056468 0.84
SCHEMBL10595248 0.83 NAAA (0.38) SMN1; SMN2CYP3A4TSHR
SCHEMBL10595092 0.83 NAAA (0.38) SMN1; SMN2CYP3A4TSHR
SCHEMBL10591972 0.83 NAAA (0.38) SMN1; SMN2CYP3A4TSHR
SCHEMBL7122607 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012118233-A1 ADDITION POLYMERIZATION METHOD, PREPOLYMERIZED CATALYTIC COMPONENT FOR ADDITION POLYMERIZATION, AND METHOD FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-09-07 WO disclosed
US-7902109-B2 Organometallic compound, catalyst for polymerization of polar group-containing norbornene and process for producing norbornene polymer FUJIFILM CORPORATION (JP) 2011-03-08 US disclosed
US-20090247729-A1 ORGANOMETALLIC COMPOUND, CATALYST FOR POLYMERIZATION OF POLAR GROUP-CONTAINING NORBORNENE AND PROCESS FOR PRODUCING NORBORNENE POLYMER FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-7442752-B2 Nobonene-ester based addition polymer and method for preparing the same LG CHEM, LTD. (KR) 2008-10-28 US disclosed
CN-100386357-C Norbornene-based ring-opening polymerization polymer, product of hydrogenation of norbornene-based ring-opening polymerization polymer, and processes for producing these ZEON CORP (JP) 2008-05-07 CN disclosed
EP-1521791-B1 NOBONENE-ESTER BASED ADDITION POLYMER AND METHOD FOR PREPARING THE SAME LG CHEMICAL LTD (KR) 2007-01-10 EP disclosed
WO-2006121058-A1 ORGANOMETALLIC COMPOUND, CATALYST FOR POLYMERIZATION OF POLAR GROUP-CONTAINING NORBORNENE AND PROCESS FOR PRODUCING NORBORNENE POLYMER FUJIFILM CORPORATION (JP) 2006-11-16 WO disclosed
US-20060177767-A1 Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. 2006-08-10 US disclosed
EP-1521791-A4 NOBONENE-ESTER BASED ADDITION POLYMER AND METHOD FOR PREPARING THE SAME LG CHEMICAL LTD (KR) 2006-05-31 EP disclosed
CN-1659205-A Norbornene-based ring-opening polymer, hydrogenation product of norbornene-based ring-opening polymer, and method for producing same ZEON CORP (JP) 2005-08-24 CN disclosed
EP-1521791-A1 NOBONENE-ESTER BASED ADDITION POLYMER AND METHOD FOR PREPARING THE SAME LG Chem, Ltd. (KR) 2005-04-13 EP disclosed
US-20050010006-A1 Nobonene-ester based addition polymer and method for preparing the same LG CHEM, LTD. (KR) 2005-01-13 US disclosed
WO-2004007587-A1 NOBONENE-ESTER BASED ADDITION POLYMER AND METHOD FOR PREPARING THE SAME LG CHEM, LTD. (KR) 2004-01-22 WO disclosed
US-20020009667-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
US-4180636-A MAGNESIUM HALIDE, TITANIUM COMPOUND ELECTRON DONOR COMPOUND, TRIALKYL ALUMINUM CATALYST SHOWA DENKO KABUSHIKI KAISHA (JP) 1979-12-25 US disclosed
US-4056543-A FROM A SUBSTITUTED NORBORNENE AND A HALOFORMATE, ALKYLLITHIUM AMIDE CATALYST EASTMAN KODAK COMPANY (US) 1977-11-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090247729-A1 ORGANOMETALLIC COMPOUND, CATALYST FOR POLYMERIZATION OF POLAR GROUP-CONTAINING NORBORNENE AND PROCESS FOR PRODUCING NORBORNENE POLYMER DDT, PHOSPHO1, POF1B OPRM1 106/4885SLC22A1 4236/4885SMN1; SMN2 3062/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.