Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | LTA4H | P09960 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | MAOA | P21397 | 2/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.36 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.35 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.35 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 1/20 | 0.35 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.33 |
| ▸ | MTNR1A | P48039 | 3/20 | 0.32 |
| ▸ | MTNR1B | P49286 | 3/20 | 0.32 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.32 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19816768 | 0.89 | CA4 (0.42) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL3895995 | 0.87 | CA4 (0.36) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL19816771 | 0.83 | LTA4H (0.38) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL432208 | 0.80 | CA4 (0.42) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL706142 | 0.80 | CA4 (0.42) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL10045718 | 0.79 | ELANE (0.58) | — | |
| SCHEMBL19816479 | 0.78 | CA4 (0.40) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL19816807 | 0.78 | CA4 (0.40) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL430249 | 0.78 | LMNA (0.39) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL705345 | 0.76 | CA4 (0.39) | CA4LMNALTA4HTSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | claimed |
| US-20190169330-A1 | Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions | BRIDGESTONE CORPORATION (JP) | 2019-06-06 | — | — | US | claimed |
| EP-3491030-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | Bridgestone Corporation (JP) | 2019-06-05 | — | — | EP | claimed |
| WO-2018022994-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORPORATION (JP) | 2018-02-01 | — | — | WO | claimed |
| US-20240262964-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| EP-4361201-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-117413005-A | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2024-01-16 | — | — | CN | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| WO-2022270336-A1 | METHOD FOR PRODUCING SILICONE POLYMER | 東レ・ファインケミカル株式会社 | 2022-12-29 | — | — | WO | disclosed |
| CN-109715680-B | Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions | 株式会社普利司通 | 2021-10-19 | — | — | CN | disclosed |
| CN-109641835-B | Method for producing carbamate | 国立研究开发法人产业技术综合研究所 | 2021-07-20 | — | — | CN | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0921561-A2 | Composition for film formation and film | JSR Corporation (JP) | 1999-06-09 | — | — | EP | disclosed |
| EP-0226208-B1 | INSULATING FILM FOR SEMICONDUCTOR, PRODUCTION OF THE SAME AND LIQUID COMPOSITION FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-11-21 | — | — | EP | disclosed |
| EP-0226208-A2 | Insulating film for semiconductor, production of the same and liquid composition for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-06-24 | — | — | EP | disclosed |