Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | FAAH | O00519 | 13/20 | 0.44 |
| ▸ | CES1 | P23141 | 10/20 | 0.44 |
| ▸ | CES2 | O00748 | 9/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | PLA2G6 | O60733 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29367413 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL29368054 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL29368723 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL29368032 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL29368705 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL29364875 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL427969 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL11969311 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL426579 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 | |
| SCHEMBL29367353 | 1.00 | EPHX1 (0.44) | EPHX1FAAHCES1CES2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | claimed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | claimed |
| EP-4459666-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | Central Glass Company, Limited (JP) | 2024-11-06 | — | — | EP | claimed |
| CN-118451534-A | Film-forming composition and method for producing substrate | 中央硝子株式会社 | 2024-08-06 | — | — | CN | claimed |
| WO-2024143097-A1 | SUBSTRATE TREATING METHOD AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2024-07-04 | — | — | WO | claimed |
| CN-115699259-A | Surface treatment method for semiconductor substrate and surface treatment agent composition | 中央硝子株式会社 | 2023-02-03 | — | — | CN | claimed |
| CN-115668459-A | Surface treatment method for semiconductor substrate and surface treatment agent composition | 中央硝子株式会社 | 2023-01-31 | — | — | CN | claimed |
| US-20220020582-A1 | BEVEL PORTION TREATMENT AGENT COMPOSITION AND METHOD OF MANUFACTURING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-01-20 | — | — | US | claimed |
| CN-113169060-A | Chamfer treatment agent composition and method for producing wafer | 中央硝子株式会社 | 2021-07-23 | — | — | CN | claimed |
| US-9748092-B2 | Liquid chemical for forming protecting film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-08-29 | — | — | US | claimed |
| US-20160148802-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS CO LTD (JP) | 2016-05-26 | — | — | US | claimed |
| US-9228120-B2 | Liquid chemical for forming protecting film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | claimed |
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | claimed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | claimed |
| US-20120017934-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-26 | — | — | US | claimed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120017934-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20120017934-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220020582-A1 | BEVEL PORTION TREATMENT AGENT COMPOSITION AND METHOD OF MANUFACTURING WAFER | SGMS1, SGMS2, SEM1 | EPHX1 907/4885FAAH 2574/4885CES1 1119/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | EPHX1 2321/4885FAAH 4385/4885CES1 1554/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.