SCHEMBL4271787

SCHEMBL4271787

CCC(CC)[N+](C)(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28580460 0.97 KDM4E (0.33)
Bromide SCHEMBL8744270 0.97
Acetic Acid SCHEMBL29114522 0.82 CA1 (0.38)
SCHEMBL28715663 0.71
SCHEMBL6906542 0.69
SCHEMBL5944525 0.69
Water SCHEMBL27689317 0.69
Hydrochloric Acid SCHEMBL28201228 0.67 TSHR (0.37)
SCHEMBL901753 0.67
Water SCHEMBL16987408 0.67 TSHR (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112805141-B Three-dimensional object precursor treatment agent composition 花王株式会社 2023-06-02 CN disclosed
CN-116057207-A Composition and method for treating substrate 富士胶片株式会社 2023-05-02 CN disclosed
US-7605271-B2 Superhigh purity ionic liquid DAI-ICHI KOGYO SEIYAKU CO., LTD (JP) 2009-10-20 US disclosed
CN-100471843-C Ultra-high purity ionic liquids DAI ICHI KOGYO SEIYAKU CO LTD (JP) 2009-03-25 CN disclosed
CN-1854129-A Ultra-high purity ionic liquids DAI ICHI KOGYO SEIYAKU CO LTD (JP) 2006-11-01 CN disclosed
US-20060223995-A1 Superhigh purity ionic liquid DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2006-10-05 US disclosed
EP-1707265-A1 Superhigh purity ionic liquid DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2006-10-04 EP disclosed