SCHEMBL901753

SCHEMBL901753

CCC(N)[N+](C)(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27680190 0.87 DNM1 (0.42)
SCHEMBL5837234 0.78 POLB (0.31)
L-Lactic Acid SCHEMBL29140952 0.78 CPT2 (0.33)
SCHEMBL908843 0.73
SCHEMBL9848691 0.73 MEN1 (0.38)
SCHEMBL7473067 0.71 ALDH1A1 (0.32)
Bromide SCHEMBL8994521 0.71
Hydrochloric Acid SCHEMBL1046383 0.71
Bromide SCHEMBL5713154 0.71 MEN1 (0.42)
Hydrochloric Acid SCHEMBL4774500 0.71 CYP3A4 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102648238-A Hydrolytically stable multi-purpose polymers LUBRIZOL ADVANCED MAT INC 2012-08-22 CN claimed
US-20100150851-A1 ANIONIC-CATIONIC COMPLEXES AS CONDITIONING AGENTS ALZO INTERNATIONAL, INC. (US) 2010-06-17 US claimed
EP-2146685-A1 ANIONIC-CATIONIC COMPLEXES AS CONDITIONING AGENTS Alzo International, Inc. (US) 2010-01-27 EP claimed
WO-2008133809-A1 ANIONIC-CATIONIC COMPLEXES AS CONDITIONING AGENTS ALZO INTERNATIONAL, INC. (US) 2008-11-06 WO claimed
JP-5222398-A None JP disclosed
JP-11130638-A None JP disclosed
US-12353166-B2 Toner, method for manufacturing the toner, toner accommodating unit, image forming apparatus, and image forming method RICOH COMPANY, LTD. (JP) 2025-07-08 US disclosed
CN-119894487-A Solid emulsifier for oil-in-water emulsion, method for producing oil-in-water emulsion, and cosmetic composition 三洋化成工业株式会社 2025-04-25 CN disclosed
US-20250129224-A1 LAMINATED POLYESTER FILM, LAMINATE, AND METHOD FOR PRODUCING LAMINATED POLYESTER FILM TORAY INDUSTRIES, INC. (JP) 2025-04-24 US disclosed
CN-119630710-A Aqueous dispersion for moisture-permeable waterproof material and method for producing same 三洋化成工业株式会社 2025-03-14 CN disclosed
CN-119497606-A Surfactant composition and cleaning agent 三洋化成工业株式会社 2025-02-21 CN disclosed
CN-114846108-B Anti-pollution material 日产化学株式会社 2024-08-20 CN disclosed
CN-1509698-A Hair cosmetics 花王株式会社 2004-07-07 CN disclosed
EP-1243435-B1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid RICOH KK (JP) 2004-06-09 EP disclosed
CN-1442129-A Hair cleaning composition KAO CORP (JP) 2003-09-17 CN disclosed
CN-1442128-A Hair clearing composition KAO CORP (JP) 2003-09-17 CN disclosed
US-20030064206-A1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid RICOH COMPANY LIMITED (JP) 2003-04-03 US disclosed
EP-1243435-A1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid Ricoh Company, Ltd. (JP) 2002-09-25 EP disclosed
JP-H11130638-A AGENT COMPOSITION FOR PERMANENT WAVE HOYU CO LTD 1999-05-18 JP disclosed
JP-H05222398-A DETERGENT COMPOSITION NIPPON OIL & FATS CO LTD 1993-08-31 JP disclosed