SCHEMBL7789709

SCHEMBL7789709

CCCCOB(CC)OCCCC

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.43
ADRB1 P08588 1/20 0.43
ADRB3 P13945 1/20 0.43
TSHR P16473 5/20 0.38
CYP3A4 P08684 2/20 0.38
ALDH1A1 P00352 1/20 0.36
LMNA P02545 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
THRB P10828 1/20 0.33
ATM Q13315 1/20 0.33
HPGD P15428 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
ANPEP P15144 1/20 0.30
LTA4H P09960 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4266622 0.91 THRB (0.39) TSHRCA1CA2THRB
SCHEMBL7789730 0.80
SCHEMBL7799144 0.79 ADRB2 (0.41) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL4274113 0.79 ANPEP (0.41) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL14983314 0.79 ADRB2 (0.41) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL8727179 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL50476 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL20224725 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL245354 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL8966752 0.77 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
EP-0808849-B1 Process for the production of ethylenic polymers SHOWA DENKO KK (JP) 2001-12-19 EP disclosed
US-6011127-A CATALYST COMPRISING A CHROMIUM COMPOUND, AN ALUMOXANE AND AN ORGANOMETALLIC ALKOXIDE AND/OR ORGANOMETALLIC SILOXIDE AND A CARRIER SUPPORTING THEREON THESE COMPOUNDS. SHOWA DENKO K.K. (JP) 2000-01-04 US disclosed
EP-0808849-A1 Process for the production of ethylenic polymers SHOWA DENKO KABUSHIKI KAISHA (JP) 1997-11-26 EP disclosed
EP-0519496-B1 Thermosetting copolymers, silicon carbide-based fiber and processes for producing same TONEN CORP (JP) 1996-05-22 EP disclosed
EP-0404503-B1 Boron-containing, silicon nitride-based ceramic shaped body production process TONEN CORP (JP) 1996-03-06 EP disclosed
EP-0389084-B1 Process for producing a polyborosilazane TONEN CORP (JP) 1995-09-20 EP disclosed
EP-0415704-B1 Catalysts for polymerization of olefins CHISSO CORP (JP) 1995-05-10 EP disclosed
US-5292830-A Silane, silazane, boron block crosslinked copolymers TONEN CORPORATION (JP) 1994-03-08 US disclosed
EP-0519496-A1 Thermosetting copolymers, silicon carbide-based fiber and processes for producing same Tonen Corporation (JP) 1992-12-23 EP disclosed
US-5128286-A BORON-CONTAINING, SILICON NITRIDE-BASED CERAMIC SHAPED BODY TONEN CORPORATION (JP) 1992-07-07 US disclosed
US-5122490-A Composed of organomagesium compounds, titanium and vanadium halides, alcohols, halogenated silanes, siloxanes, borates, electron donors and cyclic ether CHISSO CORPORATION (JP) 1992-06-16 US disclosed
US-5084429-A Coordination catalysts for olefin polymerization from magnesium, titanium, vanadium and silicon compounds CHISSO CORPORATION (JP) 1992-01-28 US disclosed
US-5030744-A Polyborosilazane and process for producing same TONEN CORPORATION (JP) 1991-07-09 US disclosed
EP-0415704-A2 Catalysts for polymerization of olefins CHISSO CORPORATION (JP) 1991-03-06 EP disclosed
EP-0404503-A1 Boron-containing, silicon nitride-based ceramic shaped body production process Tonen Corporation (JP) 1990-12-27 EP disclosed
EP-0389084-A2 Process for producing a polyborosilazane Tonen Corporation (JP) 1990-09-26 EP disclosed