SCHEMBL4277899

SCHEMBL4277899

[N-]=[N+]=CC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 1/20 0.46
HSD11B1 P28845 4/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
THRB P10828 1/20 0.35
CYP2C9 P11712 1/20 0.35
HTT P42858 2/20 0.35
ALDH1A1 P00352 2/20 0.35
CRHBP P24387 1/20 0.35
CRHR2 Q13324 1/20 0.35
MCOLN3 Q8TDD5 1/20 0.35
GLA P06280 1/20 0.35
EPHX1 P07099 1/20 0.34
EPHX2 P34913 1/20 0.34
KDM4E B2RXH2 1/20 0.34
MAPT P10636 2/20 0.33
GAA P10253 1/20 0.33
XBP1 P17861 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31618388 0.91 TGM2 (0.38) TGM2
SCHEMBL13721156 0.79 TGM2 (0.37) TGM2HSD11B1THRBCYP2C9EPHX1
SCHEMBL10214448 0.78 TGM2 (0.30) TGM2
SCHEMBL7127597 0.73 HSD11B1 (0.43) HSD11B1L3MBTL1MEN1KMT2ATHRB
SCHEMBL2451987 0.73 HSD11B1 (0.55) HSD11B1MEN1KMT2AALDH1A1GAA
Water SCHEMBL10350218 0.71 HSD11B1 (0.42) HSD11B1L3MBTL1MEN1KMT2ATHRB
SCHEMBL418510 0.71 HSD11B1 (0.42) TGM2HSD11B1L3MBTL1MEN1KMT2A
SCHEMBL11760000 0.71 ALDH1A1 (0.42) HSD11B1L3MBTL1MEN1KMT2ATHRB
SCHEMBL14277227 0.71 ALDH1A1 (0.46) TGM2HSD11B1KMT2AALDH1A1GLA
Adamantane SCHEMBL28436148 0.69 TSHR (0.41) TGM2HSD11B1THRBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7622246-B2 Photolithography using short wavelength actinic radiation (< 200 nm, such as 193 nm or 157 nm) for contrast enhancing layers (CEL) that include an organosilicon polymers, e.g., polysilanes, polysilynes; improved line resolution; increased process window; good Dill values; microstructure; semiconductors MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2009-11-24 US disclosed
US-20080076060-A1 CONTRAST ENHANCING LAYERS MASSACHUETTS INSTITUTE OF TECHNOLOGY (US) 2008-03-27 US disclosed