SCHEMBL4288604

SCHEMBL4288604

CCCCOC(OCCCC)C(=O)C(CC)(OCCCC)C(=O)[O-].[Ti+]

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7110002 0.97 ALDH1A1 (0.31) ALDH1A1
SCHEMBL6537204 0.97 ALDH1A1 (0.31) ALDH1A1
SCHEMBL1362706 0.97 ALDH1A1 (0.31) ALDH1A1
SCHEMBL4292249 0.88
SCHEMBL6537205 0.84
SCHEMBL106110 0.84
SCHEMBL1263411 0.83 ALDH1A1 (0.32) ALDH1A1
SCHEMBL647009 0.83 ALDH1A1 (0.32) ALDH1A1
SCHEMBL645728 0.83 ALDH1A1 (0.32) ALDH1A1
SCHEMBL939519 0.80 CA2 (0.39) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090214796-A1 Method for Forming Antireflection Film MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2009-08-27 US disclosed
EP-1890172-A1 METHOD FOR FORMING ANTIREFLECTION FILM Hitachi Chemical Co., Ltd. (JP) 2008-02-20 EP disclosed
US-20040198882-A1 Silica-containing coating composition for forming films and method for forming silica-containing films FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed