⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6537236 | 0.96 | — | — | |
| SCHEMBL4292249 | 0.81 | — | — | |
| SCHEMBL645521 | 0.80 | — | — | |
| SCHEMBL648651 | 0.80 | — | — | |
| SCHEMBL1263447 | 0.80 | — | — | |
| SCHEMBL4288604 | 0.79 | ALDH1A1 (0.31) | — | |
| SCHEMBL6537205 | 0.78 | — | — | |
| SCHEMBL106110 | 0.78 | — | — | |
| SCHEMBL1362706 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL6537204 | 0.76 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-20040198882-A1 | Silica-containing coating composition for forming films and method for forming silica-containing films | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |