SCHEMBL4304492

SCHEMBL4304492

CCC(CO)(CO)CO.CCCC(O)=S.CCCC(O)=S.CCCC(O)=S

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11656044 0.90 FFAR3 (0.33) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL1412288 0.90 FFAR3 (0.33) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL9564963 0.85 CES2 (0.39)
SCHEMBL11660340 0.83 CES2 (0.41)
SCHEMBL11124817 0.82 ALDH1A1 (0.30)
SCHEMBL7037751 0.82 ALDH1A1 (0.30)
SCHEMBL17453946 0.82
SCHEMBL11802153 0.79 ALDH1A1 (0.32)
SCHEMBL25238705 0.79 HDAC3 (0.44) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL37528 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4644354-A1 POLYMER MECHANORADICAL INITIATOR AND REACTION METHOD USING POLYMER MECHANORADICAL INITIATOR National University Corporation Hokkaido University (JP) 2025-11-05 EP disclosed
WO-2024142966-A1 POLYMER MECHANORADICAL INITIATOR AND REACTION METHOD USING POLYMER MECHANORADICAL INITIATOR 国立大学法人北海道大学 2024-07-04 WO disclosed
US-11958922-B2 Vinyl-based resin particles and method for producing same SEKISUI PLASTICS CO., LTD. (JP) 2024-04-16 US disclosed
WO-2023136275-A1 (METH)ACRYLIC RESIN COMPOSITION AND MOLDED ARTICLE USING SAME, AND METHOD FOR PRODUCING (METH)ACRYLIC RESIN COMPOSITION 株式会社日本触媒 2023-07-20 WO disclosed
US-20210347923-A1 VINYL-BASED RESIN PARTICLES AND METHOD FOR PRODUCING SAME SEKISUI PLASTICS CO., LTD. (JP) 2021-11-11 US disclosed
CN-112996824-A Vinyl resin pellet and method for producing same 积水化成品工业株式会社 2021-06-18 CN disclosed
US-20200399413-A1 VINYL-BASED RESIN PARTICLES AND METHOD FOR MANUFACTURING SAME SEKISUI KASEI CO., LTD. (JP) 2020-12-24 US disclosed
CN-111819224-A Vinyl resin pellet and method for producing same 积水化成品工业株式会社 2020-10-23 CN disclosed
EP-2783678-B1 POROUS RESIN PARTICLES, METHOD OF MANUFACTURING THE SAME, AND USE OF THE SAME SEKISUI PLASTICS (JP) 2016-01-20 EP disclosed
US-9200154-B2 Porous resin particles, method of manufacturing the same, and use of the same SEKISUI PLASTICS CO., LTD. (JP) 2015-12-01 US disclosed
EP-2783678-A1 Porous resin particles, method of manufacturing the same, and use of the same Sekisui Plastics Co., Ltd. (JP) 2014-10-01 EP disclosed
US-20130266797-A1 POROUS RESIN PARTICLES, METHOD OF MANUFACTURING THE SAME, AND USE OF THE SAME SEKISUI PLASTICS CO., LTD. (JP) 2013-10-10 US disclosed
US-8273518-B2 Electrophotographic toner, electrophotographic developer and production method of electrophotographic toner KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2012-09-25 US disclosed
US-20090208863-A1 ELECTROPHOTOGRAPHIC TONER, ELECTROPHOTOGRAPHIC DEVELOPER AND PRODUCTION METHOD OF ELECTROPHOTOGRAPHIC TONER KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2009-08-20 US disclosed
EP-0565891-A1 Copolymer latex, production and use thereof TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-20 EP disclosed