SCHEMBL4308375

SCHEMBL4308375

Sc1cc2ccccc2c2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.52
HSD17B10 Q99714 4/20 0.52
HIF1A Q16665 2/20 0.52
CYP1B1 Q16678 1/20 0.52
TRPM4 Q8TD43 1/20 0.52
HPRT1 P00492 3/20 0.50
TSHR P16473 2/20 0.48
CYP2A6 P11509 2/20 0.48
TDP1 Q9NUW8 1/20 0.48
POLB P06746 1/20 0.42
MAPT P10636 1/20 0.42
PKM P14618 1/20 0.42
RAD52 P43351 1/20 0.42
TAAR1 Q96RJ0 1/20 0.42
CYP1A2 P05177 4/20 0.41
HPGD P15428 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
ERBB2 P04626 1/20 0.41
FYN P06241 1/20 0.41
MAOA P21397 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14354335 0.83 HPRT1 (0.64) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL25761245 0.78 CYP2A6 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1HPRT1
SCHEMBL30958559 0.77 ALDH1A1 (0.44) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL2564943 0.77 ALDH1A1 (0.44) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL6007540 0.77 ALDH1A1 (0.44) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL6274090 0.77 CYP2A6 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL28657359 0.77 ALDH1A1 (0.50) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL16203734 0.77 CYP1A2 (0.45) ALDH1A1HSD17B10HIF1ACYP1B1HPRT1
SCHEMBL24326728 0.75 HPRT1 (0.42) ALDH1A1HSD17B10HIF1ACYP1B1TRPM4
SCHEMBL1395240 0.75 HPRT1 (0.67) ALDH1A1HSD17B10HIF1ACYP1B1HPRT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105566395-A Compound 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-sulfide (DOPS) and preparation method thereof UNIV GUIZHOU NORMAL 2016-05-11 CN claimed
US-4810364-A REMOVAL OF SULFUR, NITROGEN AND OXYGEN FROM AROMATICS PHILLIPS PETROLEUM COMPANY (US) 1989-03-07 US claimed
US-4160114-A ACID CATALYST WITH SULFUR CONTAINING CO-CATALYST REICHHOLD CHEMICALS, INC. (US) 1979-07-03 US claimed
WO-2025095196-A1 HETEROCYCLIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME 엘티소재주식회사 2025-05-08 WO disclosed
CN-111662256-B Organic electroluminescent device and polycyclic compound for organic electroluminescent device 三星显示有限公司 2025-04-04 CN disclosed
CN-118284274-A Charge-transporting varnish 日产化学株式会社 2024-07-02 CN disclosed
US-20240208200-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING PRINTING PLATE FUJIFILM CORPORATION (JP) 2024-06-27 US disclosed
EP-4365180-A1 RARE EARTH COMPLEX Tosoh Corporation (JP) 2024-05-08 EP disclosed
EP-3416956-B1 METHYLAMINE DERIVATIVES AS LYSYL OXIDASE INHIBITORS FOR THE TREATMENT OF CANCER THE INSTITUTE OF CANCER RES ROYAL CANCER HOSPITAL (GB) 2024-04-10 EP disclosed
CN-114478150-B S-deuterated methyl-aryl sulfonyl thioester compound and synthetic method and application thereof 浙江工业大学 2024-04-09 CN disclosed
US-11874602-B2 Lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method FUJIFILM CORPORATION (JP) 2024-01-16 US disclosed
CN-102597091-A Flame retardant expandable polymers SUNPOR KUNSTSTOFF GMBH 2012-07-18 CN disclosed
US-7935741-B2 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2011-05-03 US disclosed
US-7488568-B2 Resist composition, method of forming resist pattern, compound and acid generator TOKYO OHKA KOGYO CO., LTD. (JP) 2009-02-10 US disclosed
US-20080311515-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2008-12-18 US disclosed
US-20080248422-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR TOKYO OHKA KOGYO CO., LTD. (JP) 2008-10-09 US disclosed
US-7157154-B2 Organoboron polymers; photoconductivity; inks; thin films; semiconductors; surface light sources; dot matrix displays SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-02 US disclosed
US-20050170202-A1 Polymer and polymeric luminescent element comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-08-04 US disclosed
US-4160114-A ACID CATALYST WITH SULFUR CONTAINING CO-CATALYST REICHHOLD CHEMICALS, INC. (US) 1979-07-03 US disclosed
US-3973966-A Photochromic composition containing a diphenyl dibenzochrom-3-ene XEROX CORPORATION (US) 1976-08-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080248422-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR RER1, ACAD9, RRS1 ALDH1A1 796/4885HSD17B10 407/4885HIF1A 3032/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.