SCHEMBL4318482

SCHEMBL4318482

Cc1ccc(S(=O)(=O)OC2CCCC(OS(=O)(=O)c3ccc(C)cc3)C2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.56
CYP1A2 P05177 1/20 0.50
ACHE P22303 1/20 0.46
CYP3A4 P08684 2/20 0.45
CYP2C19 P33261 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.43
KMT2A Q03164 1/20 0.43
MCOLN3 Q8TDD5 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
ALDH1A1 P00352 3/20 0.42
TSHR P16473 2/20 0.42
POLB P06746 3/20 0.41
ENPP3 O14638 2/20 0.41
ENPP1 P22413 2/20 0.41
ENPP2 Q13822 2/20 0.41
GAA P10253 1/20 0.41
LMNA P02545 1/20 0.40
PKM P14618 1/20 0.39
HTT P42858 1/20 0.39
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2670048 0.93 CYP2D6 (0.63) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL6198029 0.93 CYP2D6 (0.63) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL14778959 0.93 CYP2D6 (0.59) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL6198035 0.93 CYP2D6 (0.63) CYP2D6CYP1A2ACHECYP3A4CYP2C19
Fluoride SCHEMBL27871310 0.91 CYP2D6 (0.61) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL6170506 0.91 CYP2D6 (0.51) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL777214 0.89 CYP2D6 (0.63) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL29664915 0.89 CYP2D6 (0.53) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL15070095 0.89 CYP2D6 (0.53) CYP2D6CYP1A2ACHECYP3A4CYP2C19
SCHEMBL4127356 0.89 CYP2D6 (0.50) CYP2D6CYP1A2ACHECYP3A4CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1847568-B1 THERMOSETTING RESIN COMPOSITION, THERMOSETTING-RESIN MOLDING MATERIAL, AND CURED OBJECT OBTAINED THEREFROM SUMITOMO BAKELITE CO (JP) 2015-05-20 EP claimed
WO-2024090531-A1 CATION-CURABLE COMPOSITION 日産化学株式会社 2024-05-02 WO disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
US-20170309363-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2017-10-26 US disclosed
US-9304399-B2 Resist composition and method for producing semiconductor device SONY CORPORATION (JP) 2016-04-05 US disclosed
US-9240614-B2 Nonaqueous electrolyte solution and electrochemical element using same UBE INDUSTRIES, LTD. (JP) 2016-01-19 US disclosed
EP-1847568-B1 THERMOSETTING RESIN COMPOSITION, THERMOSETTING-RESIN MOLDING MATERIAL, AND CURED OBJECT OBTAINED THEREFROM SUMITOMO BAKELITE CO (JP) 2015-05-20 EP disclosed
US-20140248777-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE SONY CORPORATION (JP) 2014-09-04 US disclosed
EP-2579377-B1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME UBE INDUSTRIES (JP) 2014-09-03 EP disclosed
US-7595144-B2 Sulfonate-containing anti-reflective coating forming composition for lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-09-29 US disclosed
EP-1305282-B1 PLEUROMUTILIN DERIVATIVES HAVING ANTIBACTERIAL ACTIVITY NABRIVA THERAPEUTICS AG (AT) 2008-09-17 EP disclosed
US-20080003524-A1 Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-01-03 US disclosed
EP-1813987-A1 SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2007-08-01 EP disclosed
US-6913867-B2 Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern KANSAI PAINT CO., LTD. (JP) 2005-07-05 US disclosed
US-6753445-B2 14-O-((CYCLOALKYL-SULFANYL)ACETYL)-, 14-O-((CYCLOALKYL-ALKYL-SULFANYL)ACETYL)-, 14-O-((CYCLOALKOXY)ACETYL)- AND 14-O-((CYCLOALKYL-ALKOXY) ACETYL) MUTILINS; MICROBIOCIDES BIOCHEMIE GESELLSCHAFT M.B.H. (AT) 2004-06-22 US disclosed
US-20030162831-A1 Pleuromutilin derivatives having antibacterial activity Nabriva Therapeutics GmbH (AT) 2003-08-28 US disclosed
EP-1305282-A1 PLEUROMUTILIN DERIVATIVES HAVING ANTIBACTERIAL ACTIVITY BIOCHEMIE GESELLSCHAFT M.B.H. (AT) 2003-05-02 EP disclosed
US-20020068237-A1 Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern KANSAI PAINT CO., LTD. (JP) 2002-06-06 US disclosed
WO-2002004414-A1 PLEUROMUTILIN DERIVATIVES HAVING ANTIBACTERIAL ACTIVITY BIOCHEMIE GESELLSCHAFT M.B.H. (AT) 2002-01-17 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030162831-A1 Pleuromutilin derivatives having antibacterial activity MLN, PLEC, ST14 CYP2D6 3132/4885CYP1A2 3555/4885ACHE 1038/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.