SCHEMBL4325259

SCHEMBL4325259

CCO[Si](CC(C1=CCCCCC1)C1=CCCCCC1)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL336091 0.83 ALDH1A1 (0.31)
SCHEMBL28425608 0.83
SCHEMBL8465074 0.75
SCHEMBL295852 0.75
SCHEMBL2530692 0.74
SCHEMBL2103132 0.74
SCHEMBL107685 0.73
SCHEMBL8671705 0.73 KMT2A (0.34)
SCHEMBL4325254 0.71 JAK2 (0.34)
SCHEMBL295859 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8716364-B2 Surface-coated reinforcing material, fluid composition for reaction injection molding, and article formed by reaction injection molding RIMTEC CORPORATION (JP) 2014-05-06 US disclosed
US-20120259053-A1 SURFACE-COATED REINFORCING MATERIAL, FLUID COMPOSITION FOR REACTION INJECTION MOLDING, AND ARTICLE FORMED BY REACTION INJECTION MOLDING RIMTEC CORPORATION (JP) 2012-10-11 US disclosed
WO-2009084775-A1 RESIST FOR E-BEAM LITHOGRAPHY SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION (KR) 2009-07-09 WO disclosed