SCHEMBL336091

SCHEMBL336091

CO[Si](CC(C1=CCCCCC1)C1=CCCCCC1)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4325259 0.83
SCHEMBL295852 0.77
SCHEMBL2530692 0.77
SCHEMBL2103132 0.77
SCHEMBL28425608 0.72
SCHEMBL8671705 0.71 KMT2A (0.34) ALDH1A1RAB9A
SCHEMBL105689 0.70
SCHEMBL107772 0.69
SCHEMBL9509596 0.68
SCHEMBL336090 0.68 RAB9A (0.37) ALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023047375-A9 METHOD OF MANUFACTURING A MEDICAL INJECTION DEVICE AND MEDICAL INJECTION DEVICE THUS OBTAINED STEVANATO GROUP S.P.A. (IT) 2023-11-16 WO claimed
WO-2023047375-A2 METHOD OF MANUFACTURING A MEDICAL INJECTION DEVICE AND MEDICAL INJECTION DEVICE THUS OBTAINED STEVANATO GROUP S.P.A. (IT) 2023-03-30 WO claimed
US-20060079099-A1 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-04-13 US claimed
US-20240408312-A1 METHOD OF MANUFACTURING A MEDICAL INJECTION DEVICE AND MEDICAL INJECTION DEVICE THUS OBTAINED STEVANTO GROUP S.P.A. (IT) 2024-12-12 US disclosed
US-20240217211-A1 METAL-RESIN LAYERED BODY AND METHOD FOR MANUFACTURING METAL-RESIN LAYERED BODY RIMTEC CORPORATION (JP) 2024-07-04 US disclosed
EP-4331836-A1 METAL-RESIN LAYERED BODY AND METHOD FOR MANUFACTURING METAL-RESIN LAYERED BODY RIMTEC Corporation (JP) 2024-03-06 EP disclosed
US-11879029-B2 Polymerizable composition, cycloolefin-based polymer, and metal/resin composite RIMTEC CORPORATION (JP) 2024-01-23 US disclosed
US-20240002585-A1 CYCLOOLEFIN RESIN CURED PRODUCT RIMTEC CORPORATION (JP) 2024-01-04 US disclosed
WO-2023047375-A9 METHOD OF MANUFACTURING A MEDICAL INJECTION DEVICE AND MEDICAL INJECTION DEVICE THUS OBTAINED STEVANATO GROUP S.P.A. (IT) 2023-11-16 WO disclosed
US-20230322978-A1 CYCLOOLEFIN RESIN CURED PRODUCT HAVING OXYGEN BARRIER PROPERTIES RIMTEC CORPORATION (JP) 2023-10-12 US disclosed
EP-4257627-A1 POLYMERIZABLE COMPOSITION AND RESIN-IMPREGNATED SUPERCONDUCTING COIL RIMTEC Corporation (JP) 2023-10-11 EP disclosed
US-7491658-B2 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-02-17 US disclosed
EP-1931746-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
US-20070196639-A1 Materials containing voids with void size controlled on the nanometer scale INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-08-23 US disclosed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20060079099-A1 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-04-13 US disclosed