SCHEMBL2103132

SCHEMBL2103132

Cl[Si](Cl)(Cl)CC(C1=CCCCCC1)C1=CCCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL295852 0.85
SCHEMBL2530692 0.78
SCHEMBL336091 0.77 ALDH1A1 (0.31)
SCHEMBL4325259 0.74
SCHEMBL8671705 0.71 KMT2A (0.34)
SCHEMBL4365354 0.69 KDM1A (0.33)
SCHEMBL919289 0.69 KDM1A (0.33)
SCHEMBL28425608 0.69
SCHEMBL2280969 0.69 CTSK (0.37)
SCHEMBL7174781 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11879029-B2 Polymerizable composition, cycloolefin-based polymer, and metal/resin composite RIMTEC CORPORATION (JP) 2024-01-23 US disclosed
EP-4011613-A1 POLYMERIZABLE COMPOSITION, CYCLOOLEFIN-BASED POLYMER, AND METAL/RESIN COMPOSITE RIMTEC Corporation (JP) 2022-06-15 EP disclosed
WO-2021024956-A1 POLYMERIZABLE COMPOSITION, CYCLOOLEFIN-BASED POLYMER, AND METAL/RESIN COMPOSITE RIMTEC株式会社 2021-02-11 WO disclosed
US-8716364-B2 Surface-coated reinforcing material, fluid composition for reaction injection molding, and article formed by reaction injection molding RIMTEC CORPORATION (JP) 2014-05-06 US disclosed
US-20120259053-A1 SURFACE-COATED REINFORCING MATERIAL, FLUID COMPOSITION FOR REACTION INJECTION MOLDING, AND ARTICLE FORMED BY REACTION INJECTION MOLDING RIMTEC CORPORATION (JP) 2012-10-11 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed