SCHEMBL4327573

SCHEMBL4327573

O=S(=O)(Cl)C1c2ccccc2-c2ccccc21

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
GPR3 P46089 1/20 0.38
HTR2A P28223 1/20 0.38
KMT2A Q03164 3/20 0.38
NCOR2 Q9Y618 2/20 0.38
MEN1 O00255 2/20 0.38
CDC25B P30305 2/20 0.38
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
HDAC6 Q9UBN7 1/20 0.38
HDAC9 Q9UKV0 1/20 0.38
HDAC5 Q9UQL6 1/20 0.38
IDO1 P14902 1/20 0.37
DNMT1 P26358 1/20 0.37
DNMT3L Q9UJW3 1/20 0.37
DNMT3A Q9Y6K1 1/20 0.37
ALDH1A1 P00352 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17308141 0.76 GPR3 (0.43) CA1CA2GPR3HTR2AKMT2A
SCHEMBL29945031 0.76 NCOR2 (0.42) CA1CA2GPR3HTR2AKMT2A
SCHEMBL2319486 0.76 NCOR2 (0.42) CA1CA2GPR3HTR2AKMT2A
SCHEMBL10425774 0.76 CA1 (0.50) CA1CA2GPR3HTR2AKMT2A
SCHEMBL5008319 0.76 CA1 (0.41) CA1CA2GPR3HTR2AKMT2A
SCHEMBL9226919 0.76 MAOA (0.48) KMT2AMEN1HDAC3HDAC4HDAC7
SCHEMBL13857648 0.71 GPR3 (0.40) CA1CA2GPR3HTR2AKMT2A
SCHEMBL20968147 0.70 GPR3 (0.46) CA1CA2GPR3HTR2AKMT2A
SCHEMBL19042320 0.70 GPR3 (0.46) CA1CA2GPR3HTR2AKMT2A
SCHEMBL10778363 0.69 MAPK1 (0.36) CA1CA2KMT2ANCOR2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101052919-B Sulfonate-containing composition for forming anti-reflective coating for lithography NISSAN CHEMICAL IND LTD 2011-05-25 CN disclosed
CN-101040221-B Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent NISSAN CHEMICAL IND LTD 2010-06-16 CN disclosed
US-7595144-B2 Sulfonate-containing anti-reflective coating forming composition for lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-09-29 US disclosed
CN-101052919-A Sulfonate-containing composition for forming anti-reflective coating for lithography NISSAN CHEMICAL IND LTD (JP) 2007-10-10 CN disclosed
CN-101040221-A Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent NISSAN CHEMICAL IND LTD (JP) 2007-09-19 CN disclosed
EP-1813987-A1 SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2007-08-01 EP disclosed
US-4968809-A Spirofluoreneisothiazolidinone dioxides as aldose reductase inhibitors NESTLE S.A. A COMPANY OF SWITZERLAND (CH) 1990-11-06 US disclosed