SCHEMBL4331882

SCHEMBL4331882

COC(C)(CC(C)=O)CC(C)(OC)OC.COC(C)OC.COC(C)OC.COC(C)OC.COC(C)OC.COC(C)OC.COC(C)OC.COC(C)OC.COC(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13645743 0.73 ALDH1A1 (0.36)
SCHEMBL28519711 0.70 GAA (0.38)
SCHEMBL27849049 0.66 LMNA (0.35)
Butanone SCHEMBL8748901 0.66 ALDH1A1 (0.56)
SCHEMBL924218 0.66
Acetone SCHEMBL593191 0.65 LMNA (0.43)
SCHEMBL4336688 0.63
Acetic Acid SCHEMBL10711426 0.62 FFAR3 (0.47)
Methyl Isobutyl Ketone SCHEMBL15440343 0.62 ALDH1A1 (0.70)
SCHEMBL11004933 0.62 MGAM (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8906586-B2 Coating fluid for photosensitive-layer formation, process for producing the same, photoreceptor produced with the coating fluid, image-forming apparatus employing the photoreceptor, and electrophotographic cartridge employing the photoreceptor MITSUBISHI CHEMICAL CORPORATION (JP) 2014-12-09 US disclosed
US-20090202274-A1 COATING FLUID FOR PHOTOSENSITIVE-LAYER FORMATION, PROCESS FOR PRODUCING THE SAME, PHOTORECEPTOR PRODUCED WITH THE COATING FLUID, IMAGE-FORMING APPARATUS EMPLOYING THE PHOTORECEPTOR, AND ELECTROPHOTOGRAPHIC CARTRIDGE EMPLOYING THE PHOTORECEPTOR MITSUBISHI CHEMICAL CORPORATION (JP) 2009-08-13 US disclosed