⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9220724 | 0.83 | — | — | |
| SCHEMBL9007112 | 0.81 | KDM1A (0.33) | — | |
| SCHEMBL3684573 | 0.80 | LMNA (0.34) | — | |
| SCHEMBL31549868 | 0.79 | MMP2 (0.34) | — | |
| SCHEMBL31424582 | 0.78 | SLC6A2 (0.38) | — | |
| SCHEMBL20337296 | 0.78 | — | — | |
| SCHEMBL2783528 | 0.78 | — | — | |
| SCHEMBL28305153 | 0.78 | — | — | |
| SCHEMBL21043747 | 0.78 | PSEN1 (0.33) | — | |
| SCHEMBL18423613 | 0.76 | MEN1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260005022-A1 | SPIN ON CARBON HARDMASK COMPOSITIONS WITH LOW EVAPORATION LOSS AND PATTERNING METHOD BY USING THE SAME | YCCHEM CO LTD (KR) | 2026-01-01 | — | — | US | disclosed |
| EP-4343435-A1 | SPIN-ON CARBON HARD MASK COMPOSITION HAVING LOW EVAPORATION LOSS, AND PATTERNING METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2024-03-27 | — | — | EP | disclosed |
| CN-117321503-A | Spin-on carbon hardmask composition with low evaporation loss and patterning method using the same | YC化学制品株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-115398339-A | Photosensitive resin composition, method for producing patterned cured film, and semiconductor device | 昭和电工材料株式会社 | 2022-11-25 | — | — | CN | disclosed |
| WO-2022245014-A1 | SPIN-ON CARBON HARD MASK COMPOSITION HAVING LOW EVAPORATION LOSS, AND PATTERNING METHOD USING SAME | 영창케미칼 주식회사 | 2022-11-24 | — | — | WO | disclosed |
| US-20090012203-A1 | Epoxy Resin and Epoxy Resin Composition | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2009-01-08 | — | — | US | disclosed |