SCHEMBL433836

SCHEMBL433836

CCCOC(CC(=O)O[Ti])OCCC

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.33
DGKA P23743 1/20 0.33
LMNA P02545 2/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8433989 0.80 TSHR (0.40) ALDH1A1
SCHEMBL11090336 0.80 NAAA (0.39) NAAADGKALMNAALDH1A1
SCHEMBL8574175 0.78 MGAM (0.46) NAAALMNAALDH1A1
SCHEMBL13644543 0.72 TSHR (0.37) NAAAALDH1A1
SCHEMBL26007106 0.72 GPR84 (0.34) LMNA
SCHEMBL1879488 0.71 NAAA (0.48) NAAADGKALMNAALDH1A1
SCHEMBL1879519 0.71 NAAA (0.44) NAAADGKALMNAALDH1A1
SCHEMBL1883376 0.71 CA12 (0.41) NAAADGKAALDH1A1
SCHEMBL10719159 0.70 NAAA (0.47) NAAADGKALMNAALDH1A1
SCHEMBL1880553 0.70 LMNA (0.37) NAAALMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2596148-B1 METHOD FOR MANUFACTURING A BARRIER COATING. FUJIFILM MFG EUROPE BV (NL) 2018-09-26 EP disclosed
EP-2596147-B1 METHOD FOR MANUFACTURING A BARRIER LAYER FUJIFILM MFG EUROPE BV (NL) 2017-09-06 EP disclosed
US-8815750-B2 Method for manufacturing a barrier on a sheet and a sheet for PV modules FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2014-08-26 US disclosed
US-8815749-B2 Method for manufacturing a barrier layer on a substrate and a multi-layer stack FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2014-08-26 US disclosed
US-20130178060-A1 Method for Manufacturing a Barrier Layer on a Substrate and a Multi-Layer Stack FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2013-07-11 US disclosed
EP-2596147-A1 METHOD FOR MANUFACTURING A BARRIER LAYER Fujifilm Manufacturing Europe BV (NL) 2013-05-29 EP disclosed
EP-2596148-A1 METHOD FOR MANUFACTURING A BARRIER COATING Fujifilm Manufacturing Europe BV (NL) 2013-05-29 EP disclosed
US-8445897-B2 Method for manufacturing a multi-layer stack structure with improved WVTR barrier property FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2013-05-21 US disclosed
US-20130122719-A1 Method for Manufacturing a Barrier on a Sheet and a Sheet for PV Modules FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2013-05-16 US disclosed
US-8323753-B2 Method for deposition using pulsed atmospheric pressure glow discharge FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2012-12-04 US disclosed
WO-2007091891-A1 SHORT PULSE ATMOSPHERIC PRESSURE GLOW DISCHARGE METHOD AND APPARATUS FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2007-08-16 WO disclosed
US-7239444-B2 Display front plane, display lenticular lens, and display fresnel lens KONICA MINOLTA HOLDINGS, INC. (JP) 2007-07-03 US disclosed
US-7166335-B2 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2007-01-23 US disclosed
US-20060199014-A1 supplying discharge gas containing nitrogen into space formed between electrodes transferring energy of excited discharge gas to film forming gas, exposing substrate to film forming gas KONICA MINOLTA HOLDINGS, INC. (JP) 2006-09-07 US disclosed
EP-1645657-A1 METHOD FOR FORMING THIN FILM AND BASE HAVING THIN FILM FORMED BY SUCH METHOD KONICA MINOLTA HOLDINGS, INC. (JP) 2006-04-12 EP disclosed
US-20050068617-A1 Display front plane, display linticular lens, and display fresnel lens KONICA MINOLTA HOLDINGS, INC. (JP) 2005-03-31 US disclosed
US-20040213920-A1 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2004-10-28 US disclosed
US-6759100-B2 ATMOSPHERIC PRESSURE PLASMA DISCHARGE TREATMENT; CHEAP AND SAFE DISCHARGE GAS SUCH AS NITROGEN KONICA CORPORATION (JP) 2004-07-06 US disclosed
US-20030232136-A1 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2003-12-18 US disclosed
EP-1371752-A2 Layer formation method, and substrate with a layer formed by the method KONICA CORPORATION (JP) 2003-12-17 EP disclosed