SCHEMBL4338402

SCHEMBL4338402

Cc1ccc(-c2ccc(-c3ccc(C)cc3C)o2)c(C)c1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.63
ALDH1A1 P00352 4/20 0.46
HPGD P15428 2/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
GAA P10253 2/20 0.42
MAPT P10636 2/20 0.42
KDM4E B2RXH2 2/20 0.41
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
TDP1 Q9NUW8 2/20 0.41
TP53 P04637 1/20 0.41
SLC9A1 P19634 1/20 0.39
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
S1PR4 O95977 2/20 0.37
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2321863 0.81 ESR1 (0.44) ESR1ALDH1A1HPGDMEN1KMT2A
SCHEMBL2321869 0.81 KDM4E (0.47) ESR1ALDH1A1HPGDMEN1KMT2A
SCHEMBL8739216 0.80 ALDH1A1 (0.59) ESR1ALDH1A1HPGDMEN1KMT2A
SCHEMBL31547677 0.79 TDP1 (0.52) ESR1ALDH1A1MEN1KMT2AGAA
SCHEMBL3043421 0.79 TDP1 (0.52) ESR1ALDH1A1MEN1KMT2AGAA
SCHEMBL3366366 0.77 ESR1 (0.59) ESR1ALDH1A1HPGDMEN1KMT2A
SCHEMBL6514220 0.76 KDM4E (0.47) ALDH1A1HPGDMEN1KMT2AGAA
SCHEMBL11865671 0.76 CA1 (0.45) ESR1ALDH1A1KMT2AGAAMAPT
SCHEMBL29038580 0.74 MAPT (0.48) ESR1ALDH1A1MEN1KMT2AGAA
SCHEMBL15115339 0.73 L3MBTL1 (0.38) ESR1ALDH1A1HPGDMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US claimed
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US disclosed
US-20070077514-A1 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-04-05 US disclosed