SCHEMBL4338939

SCHEMBL4338939

c1ccc(Cc2ccc(-c3ccc(-c4ccc(Cc5ccccc5)cc4)o3)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 1/20 0.55
ALDH1A1 P00352 4/20 0.52
HPGD P15428 3/20 0.52
IDH1 O75874 1/20 0.47
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
NQO2 P16083 1/20 0.46
CYP2E1 P05181 1/20 0.45
CYP3A4 P08684 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2A6 P11509 1/20 0.45
CYP2C9 P11712 1/20 0.45
CYP2B6 P20813 1/20 0.45
CYP2C19 P33261 1/20 0.45
KDM4E B2RXH2 2/20 0.45
LMNA P02545 1/20 0.45
ERCC5 P28715 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3023730 0.83 KDM4E (0.59) CALM1ALDH1A1HPGDCYP2E1CYP3A4
SCHEMBL198432 0.80 CALM1 (0.75) CALM1ALDH1A1IDH1CA12CA1
SCHEMBL27326 0.78 CALM1 (0.71) CALM1ALDH1A1IDH1CA12CA1
SCHEMBL4340657 0.78 ALDH1A1 (0.61) ALDH1A1HPGDNQO2CYP2E1CYP3A4
SCHEMBL4344550 0.78 ALDH1A1 (0.61) ALDH1A1HPGDNQO2CYP2E1CYP3A4
SCHEMBL76097 0.77 CYP2E1 (0.58) ALDH1A1HPGDNQO2CYP2E1CYP3A4
SCHEMBL8094422 0.77 CALM1 (0.92) CALM1ALDH1A1IDH1CA12CA1
SCHEMBL972712 0.77 CALM1 (0.92) CALM1ALDH1A1IDH1CA12CA1
SCHEMBL28267839 0.77 TAAR1 (0.63) CALM1ALDH1A1HPGDCA12CA1
Methane SCHEMBL9562367 0.75 CALM1 (0.67) CALM1ALDH1A1IDH1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US claimed
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US disclosed
US-20070077514-A1 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-04-05 US disclosed