SCHEMBL435282

SCHEMBL435282

O=C(O)C(S)C(C(S)C(=O)O)(C(S)C(=O)O)C(CO)(CO)CCO

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
RNPEP Q9H4A4 1/20 0.32
HPGD P15428 2/20 0.31
HSD17B10 Q99714 2/20 0.31
TDP1 Q9NUW8 2/20 0.31
ABCB11 O95342 1/20 0.31
F2 P00734 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPT P10636 1/20 0.31
ALOX15 P16050 1/20 0.31
KMT2A Q03164 1/20 0.31
DUSP3 P51452 1/20 0.31
PTPN5 P54829 1/20 0.31
PTPN11 Q06124 1/20 0.31
LMNA P02545 1/20 0.31
CYP2C9 P11712 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL432443 0.86 RNPEP (0.37) RNPEPHPGDHSD17B10TDP1ABCB11
SCHEMBL129335 0.78 SLC22A6 (0.30)
SCHEMBL9805867 0.77 LMNA (0.31) LMNA
SCHEMBL14796467 0.75 RNPEP (0.34) RNPEP
SCHEMBL1852982 0.75 FOLH1 (0.39)
SCHEMBL1848279 0.72 CAMK2A (0.38) LMNA
SCHEMBL5744576 0.72
SCHEMBL1855376 0.71 GSTK1 (0.40) ALDH1A1LMNA
SCHEMBL29092215 0.69 RNPEP (0.39) RNPEPHPGDHSD17B10TDP1ABCB11
SCHEMBL1255080 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 391 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815800-B2 Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-11-14 US claimed
US-11597839-B2 Methods for making an object and formulations for use in said methods PHOTOCENTRIC LIMITED (GB) 2023-03-07 US claimed
EP-3509135-B1 COMPOSITE MEMBRANE, ANODE STRUCTURE INCLUDING THE COMPOSITE MEMBRANE, LITHIUM BATTERY INCLUDING THE ANODE STRUCTURE, AND METHOD OF PREPARING THE COMPOSITE MEMBRANE SAMSUNG ELECTRONICS CO LTD (KR) 2022-04-27 EP claimed
US-11286327-B2 FR composite composition for light-based additive manufacturing THE BOEING COMPANY (US) 2022-03-29 US claimed
US-20220004098-A1 PHOTOSENSITIVE COMPOSITIONS, QUANTUM DOT POLYMER COMPOSITE PATTERN PREPARED THEREFROM, AND ELECTRONIC DEVICES INCLUDING THE SAME SAMSUNG ELECTRONICS CO LTD (KR) 2022-01-06 US claimed
US-11126080-B2 Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-09-21 US claimed
EP-3492501-B1 RESIN COMPOSITION HOYA LENS THAILAND LTD (TH) 2021-06-23 EP claimed
US-20210171697-A1 FR COMPOSITE COMPOSITION FOR LIGHT-BASED ADDITIVE MANUFACTURING THE BOEING COMPANY (US) 2021-06-10 US claimed
US-10988685-B2 Quantum dots, a composition or composite including the same, and an electronic device including the same SAMSUNG DISPLAY CO., LTD. (KR) 2021-04-27 US claimed
EP-3327814-B1 QUANTUM DOTS, A COMPOSITION OR COMPOSITE INCLUDING THE SAME, AND AN ELECTRONIC DEVICE INCLUDING THE SAME SAMSUNG ELECTRONICS CO LTD (KR) 2020-10-28 EP claimed
EP-1031579-B1 Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter SHOWA DENKO KK (JP) 2005-07-27 EP claimed
EP-1177241-B1 OPTICAL RESIN COMPOSITION COMPRISING THIOL-ENE PREPOLYMER PPG IND OHIO INC (US) 2005-06-22 EP claimed
EP-1250369-B1 METHOD OF PREPARING AN OPTICAL POLYMERIZATE PPG IND OHIO INC (US) 2005-06-08 EP claimed
EP-1250370-B1 METHOD OF PREPARING AN OPTICAL POLYMERIZATE PPG IND OHIO INC (US) 2005-06-01 EP claimed
EP-0802431-B1 Process for the production of polyurethane lens HOYA CORP (JP) 2002-01-16 EP claimed
EP-0803743-B1 Process for the production of polyurethane lens HOYA CORP (JP) 2002-01-16 EP claimed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US claimed
EP-0645647-B1 Process for the reproduction of polyurethane lens HOYA CORP (JP) 1998-01-14 EP claimed
EP-0562966-B1 A cyclic sulfide compound, polymerizable compositions for optical products and optical products formed thereof DAISO CO LTD (JP) 1997-05-07 EP claimed
EP-0308916-B1 STYRENE-BASED POLYMERS AND PROCESS FOR PRODUCTION THEREOF IDEMITSU PETROCHEMICAL CO. LTD. (JP) 1992-05-13 EP claimed