Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 6/20 | 0.60 |
| ▸ | CES1 | P23141 | 6/20 | 0.60 |
| ▸ | DNM1 | Q05193 | 3/20 | 0.52 |
| ▸ | NAAA | Q02083 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | JAK2 | O60674 | 1/20 | 0.49 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.49 |
| ▸ | EGFR | P00533 | 2/20 | 0.49 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.49 |
| ▸ | THRA | P10827 | 3/20 | 0.48 |
| ▸ | THRB | P10828 | 3/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzil SCHEMBL4349588 | 1.00 | CES2 (0.60) | CES2CES1DNM1NAAARAB9A | |
| Benzil SCHEMBL4358252 | 1.00 | CES2 (0.60) | CES2CES1DNM1NAAARAB9A | |
| Dymanthine SCHEMBL2906320 | 1.00 | CES2 (0.60) | CES2CES1DNM1NAAARAB9A | |
| Benzil SCHEMBL4359778 | 1.00 | CES2 (0.60) | CES2CES1DNM1NAAARAB9A | |
| Benzil SCHEMBL4349851 | 1.00 | CES2 (0.60) | CES2CES1DNM1NAAARAB9A | |
| Dymanthine SCHEMBL9189545 | 0.98 | CES2 (0.58) | CES2CES1DNM1NAAARAB9A | |
| Benzil SCHEMBL9190633 | 0.98 | CES2 (0.58) | CES2CES1DNM1NAAARAB9A | |
| Benzil SCHEMBL9183105 | 0.98 | CES2 (0.58) | CES2CES1DNM1NAAARAB9A | |
| Benzoic Acid SCHEMBL613345 | 0.90 | DNM1 (0.52) | CES2CES1DNM1NAAARAB9A | |
| Benzil SCHEMBL3855789 | 0.90 | CES2 (0.60) | CES2CES1NAAARAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808976-B2 | Photoresist developer and method for fabricating substrate by using the developer thereof | TOKUYAMA CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20090130606-A1 | PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING THE DEVELOPER THEREOF | TOKUYAMA CORPORATION (JP) | 2009-05-21 | — | — | US | disclosed |