SCHEMBL4354480

SCHEMBL4354480

C=C(C(=O)O)C(C)c1c2ccccc2cc2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
HPGD P15428 5/20 0.46
KDM4E B2RXH2 4/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
GLA P06280 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2C19 P33261 1/20 0.46
HSD17B10 Q99714 1/20 0.46
AKR1B1 P15121 2/20 0.43
MAPT P10636 4/20 0.40
LMNA P02545 3/20 0.40
ATM Q13315 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
XBP1 P17861 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
AKR1C3 P42330 1/20 0.37
AKR1C2 P52895 1/20 0.37
NCEH1 Q6PIU2 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1882695 0.82 AKR1B1 (0.55) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL7559407 0.81 AKR1B1 (0.41) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL18832089 0.77 PTGER4 (0.45) ALDH1A1HPGDCYP1A2CYP2C19LMNA
SCHEMBL8438808 0.75 PTGS1 (0.45) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL5452453 0.74 KDM4E (0.47) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL348322 0.72 HPGD (0.52) ALDH1A1HPGDKDM4EHSD17B10MAPT
SCHEMBL3495213 0.72 MEN1 (0.52) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL7559413 0.71 ALDH1A1 (0.43) ALDH1A1HPGDKDM4EMEN1KMT2A
Methacrylic Acid SCHEMBL6058457 0.70 ALDH1A1 (0.50) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL4935324 0.70 CES2 (0.42) ALDH1A1HPGDKDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8257908-B2 Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-09-04 US disclosed
US-20090253076-A1 Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-10-08 US disclosed