Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | GRIK1 | P39086 | 2/20 | 0.32 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9436874 | 0.98 | GRIK1 (0.33) | TSHRGRIK1GRIK2CES2CES1 | |
| SCHEMBL28059258 | 0.85 | ALDH1A1 (0.34) | GRIK1GRIK2 | |
| SCHEMBL8714650 | 0.81 | ALDH1A1 (0.42) | — | |
| SCHEMBL29108764 | 0.79 | ALDH1A1 (0.45) | — | |
| SCHEMBL20878786 | 0.79 | ALDH1A1 (0.45) | — | |
| SCHEMBL4863395 | 0.79 | GRIK1 (0.32) | GRIK1GRIK2CES2CES1 | |
| SCHEMBL27720510 | 0.78 | GRIK1 (0.33) | TSHRGRIK1GRIK2 | |
| SCHEMBL9436873 | 0.78 | GRIK1 (0.33) | GRIK1GRIK2CES2CES1 | |
| SCHEMBL21722132 | 0.74 | SMN1; SMN2 (0.36) | TSHRGRIK1GRIK2CES2CES1 | |
| SCHEMBL9245846 | 0.74 | EPHX1 (0.38) | TSHRGRIK1CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | claimed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| EP-3436210-B1 | FUNCTIONALIZED LAMINATED OPTICAL ELEMENT WITH IMPROVED EDGING RESISTANCE | ESSILOR INT (FR) | 2024-06-12 | — | — | EP | disclosed |
| US-11982941-B2 | Flexographic printing plate precursor | SUMITOMO RIKO COMPANY LIMITED (JP) | 2024-05-14 | — | — | US | disclosed |
| CN-115491132-B | Ultraviolet light curing composition | 台湾永光化学工业股份有限公司 | 2024-02-23 | — | — | CN | disclosed |
| US-11772343-B2 | Functionalized laminated optical element with improved edging resistance | ESSILOR INTERNATIONAL (FR) | 2023-10-03 | — | — | US | disclosed |
| EP-3650239-B1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR | SUMITOMO RIKO CO LTD (JP) | 2023-04-19 | — | — | EP | disclosed |
| CN-109070232-B | Functionalized laminated optical element with improved edging resistance | 依视路国际公司 | 2021-11-16 | — | — | CN | disclosed |
| US-20200241416-A1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR | SUMITOMO RIKO COMPANY LIMITED (JP) | 2020-07-30 | — | — | US | disclosed |
| EP-3650239-A1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR | Sumitomo Riko Company Limited (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | disclosed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | disclosed |
| US-20060280878-A1 | Column spacer, liquid crystal display element and curable resin composition for column spacer | SEKISUI CHEMICAL CO., LTD. (JP) | 2006-12-14 | — | — | US | disclosed |
| CN-1877449-A | Negative light-sensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2006-12-13 | — | — | CN | disclosed |
| EP-1715373-A1 | COLUMN SPACER, LIQUID CRYSTAL DISPLAY ELEMENT AND CURABLE RESIN COMPOSITION FOR COLUMN SPACER | SEKISUI CHEMICAL CO., LTD. (JP) | 2006-10-25 | — | — | EP | disclosed |
| CN-1828416-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2006-09-06 | — | — | CN | disclosed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | disclosed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | disclosed |