Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 13/20 | 0.61 |
| ▸ | CES1 | P23141 | 12/20 | 0.61 |
| ▸ | RAB9A | P51151 | 1/20 | 0.59 |
| ▸ | EGFR | P00533 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | PGR | P06401 | 1/20 | 0.48 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.48 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.48 |
| ▸ | HTR2A | P28223 | 1/20 | 0.48 |
| ▸ | HRH1 | P35367 | 1/20 | 0.48 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzil SCHEMBL8695965 | 0.88 | CES2 (0.56) | CES2CES1RAB9AEGFRALDH1A1 | |
| Benzoic Acid SCHEMBL28676134 | 0.87 | TSHR (0.61) | CES2CES1RAB9AEGFRKMT2A | |
| Benzil SCHEMBL4351569 | 0.84 | CES2 (0.64) | CES2CES1RAB9AEGFRALDH1A1 | |
| Benzil SCHEMBL1422480 | 0.84 | CES2 (0.78) | CES2CES1RAB9AEGFRALDH1A1 | |
| Benzil SCHEMBL7112388 | 0.84 | CES2 (0.78) | CES2CES1RAB9AKMT2AALDH1A1 | |
| Benzil SCHEMBL5027688 | 0.83 | CES2 (0.61) | CES2CES1RAB9AEGFRALDH1A1 | |
| Benzil SCHEMBL3415965 | 0.83 | CES2 (0.61) | CES2CES1RAB9AEGFRALDH1A1 | |
| Benzil SCHEMBL4352841 | 0.82 | CES2 (0.57) | CES2CES1RAB9AKMT2AKCNH2 | |
| Benzil SCHEMBL4358244 | 0.82 | CES2 (0.57) | CES2CES1RAB9AKMT2AKCNH2 | |
| Benzil SCHEMBL4361937 | 0.82 | CES2 (0.57) | CES2CES1RAB9AKMT2AKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808976-B2 | Photoresist developer and method for fabricating substrate by using the developer thereof | TOKUYAMA CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20090130606-A1 | PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING THE DEVELOPER THEREOF | TOKUYAMA CORPORATION (JP) | 2009-05-21 | — | — | US | disclosed |