Benzil

Benzil

SCHEMBL4351569

CCN(CC)CC.O=C(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CES2 O00748 14/20 0.64
CES1 P23141 13/20 0.64
RAB9A P51151 1/20 0.55
ALDH1A1 P00352 3/20 0.52
KDM4E B2RXH2 1/20 0.52
MAPT P10636 1/20 0.52
AGTR1 P30556 1/20 0.52
NPSR1 Q6W5P4 1/20 0.50
HPGD P15428 1/20 0.50
PGR P06401 1/20 0.50
ADRA2A P08913 1/20 0.50
ADRA2B P18089 1/20 0.50
HTR2A P28223 1/20 0.50
HRH1 P35367 1/20 0.50
KCNH2 Q12809 1/20 0.50
EGFR P00533 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzil SCHEMBL5027688 0.98 CES2 (0.61) CES2CES1RAB9AALDH1A1KDM4E
Benzil SCHEMBL3415965 0.98 CES2 (0.61) CES2CES1RAB9AALDH1A1KDM4E
Benzoyl Formic Acid SCHEMBL5494525 0.91 CES2 (0.55) CES2CES1RAB9AALDH1A1KDM4E
Benzophenone SCHEMBL8962994 0.86 ALDH1A1 (0.66) RAB9AALDH1A1KDM4EMAPTAGTR1
Benzoic Acid SCHEMBL1463186 0.86 TSHR (0.64) CES2CES1ALDH1A1KDM4EMAPT
Benzil SCHEMBL7112388 0.85 CES2 (0.78) CES2CES1RAB9AALDH1A1KDM4E
SCHEMBL27692626 0.84 ALDH1A1 (0.50) CES2CES1ALDH1A1KDM4EMAPT
Benzil SCHEMBL4356607 0.84 CES2 (0.61) CES2CES1RAB9AALDH1A1HPGD
Benzil SCHEMBL337491 0.83 CES2 (0.74) CES2CES1RAB9AALDH1A1KDM4E
Benzil SCHEMBL2127737 0.83 CES2 (0.74) CES2CES1RAB9AALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8808976-B2 Photoresist developer and method for fabricating substrate by using the developer thereof TOKUYAMA CORPORATION (JP) 2014-08-19 US disclosed
US-20090130606-A1 PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING THE DEVELOPER THEREOF TOKUYAMA CORPORATION (JP) 2009-05-21 US disclosed