SCHEMBL4362809

SCHEMBL4362809

C=CCC(CCCCCC)SCCC

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.39
FDPS P14324 4/20 0.33
FAAH O00519 1/20 0.33
LMNA P02545 1/20 0.32
ALDH1A1 P00352 1/20 0.32
ADH1B P00325 1/20 0.32
ADH1C P00326 1/20 0.32
ADH1A P07327 1/20 0.32
ADH4 P08319 1/20 0.32
ADH7 P40394 1/20 0.32
DNM1 Q05193 2/20 0.31
FFAR4 Q5NUL3 2/20 0.31
FFAR1 O14842 2/20 0.31
OPRM1 P35372 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8946847 0.82 TSHR (0.43) TSHRFAAHLMNAALDH1A1ADH1B
SCHEMBL27274562 0.82 FDPS (0.41) TSHRFDPSLMNADNM1FFAR1
SCHEMBL7573974 0.79 FDPS (0.36) TSHRFDPSLMNADNM1FFAR1
SCHEMBL10529974 0.77 FDPS (0.35) TSHRFDPSLMNADNM1FFAR1
SCHEMBL28686473 0.76 OPRM1 (0.37) TSHRFDPSLMNADNM1FFAR1
SCHEMBL757054 0.74 TSHR (0.39) TSHRALDH1A1DNM1
SCHEMBL5165999 0.74 TSHR (0.39) TSHRALDH1A1DNM1
SCHEMBL23129956 0.73 EPHX1 (0.45) TSHRFDPSLMNADNM1OPRM1
SCHEMBL20633855 0.73 FDPS (0.41) TSHRFDPSLMNADNM1OPRM1
SCHEMBL23130425 0.73 EPHX1 (0.45) TSHRFDPSLMNADNM1OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8487071-B2 Polyether polymer and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-16 US disclosed
US-20110065889-A1 POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
WO-2009142094-A1 POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-26 WO disclosed