SCHEMBL436571

SCHEMBL436571

O=C(O)c1c(C(=O)O)c(C(F)(F)F)c(C(=O)O)c(C(=O)O)c1C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR35 Q9HC97 1/20 0.38
RXRA P19793 2/20 0.35
RXRB P28702 2/20 0.35
TSHR P16473 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
RXRG P48443 1/20 0.35
CYP1A2 P05177 1/20 0.35
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
DAO P14920 1/20 0.34
SRD5A2 P31213 1/20 0.34
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32
NOTUM Q6P988 1/20 0.31
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1634950 0.91 GPR35 (0.36) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL14322147 0.89 SMN1; SMN2 (0.39) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL9142308 0.88 GPR35 (0.38) GPR35RXRARXRBTSHRSMN1; SMN2
Hydrochloric Acid SCHEMBL9344466 0.85 GPR35 (0.36) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL31244452 0.85 GPR35 (0.36) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL1100208 0.84 GPR35 (0.33) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL27700963 0.84 SMN1; SMN2 (0.39) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL22115216 0.84 SMN1; SMN2 (0.44) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL10606616 0.84 SMN1; SMN2 (0.48) GPR35RXRARXRBTSHRSMN1; SMN2
SCHEMBL31542028 0.82 SMN1; SMN2 (0.38) GPR35RXRARXRBTSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117402172-A Synthesis method of 3, 6-bis (trifluoromethyl) -pyromellitic dianhydride 中国科学院上海有机化学研究所 2024-01-16 CN claimed
CN-108745006-B Fluorine-containing polyimide hollow fiber membrane and preparation method thereof 北京化工大学 2020-08-07 CN claimed
CN-106478968-B A kind of preparation method of nanometer of Kapton 陕西科技大学 2019-06-28 CN claimed
CN-109627439-A A kind of polyimides of the structure containing young laying ducks in cage and preparation method thereof 株洲时代新材料科技股份有限公司 2019-04-16 CN claimed
CN-106478968-A A kind of preparation method of nanometer of Kapton 陕西科技大学 2017-03-08 CN claimed
US-20070009751-A1 Polyamic acid resin composition modified with laminate nanometer silica sheet and polyimide prepared therefrom CHANG CHUN PLASTICS CO., LTD. (TW) 2007-01-11 US claimed
US-7005163-B2 Organic-inorganic hybrid film material and its fabrication CHANG CHUN PLASTICS CO., LTD. (TW) 2006-02-28 US claimed
US-20040110014-A1 Organic-inorganic hybrid film material and its fabrication CHANG CHUN PLASTICS CO., LTD. (TW) 2004-06-10 US claimed
EP-0400635-B1 Liquid crystal device CANON KK (JP) 1995-09-27 EP claimed
US-5192596-A Polyimide CANON KABUSHIKI KAISHA (JP) 1993-03-09 US claimed
EP-0400635-A2 Liquid crystal device CANON KABUSHIKI KAISHA (JP) 1990-12-05 EP claimed
WO-2024025150-A1 CURED FILM, PHOTOSENSITIVE RESIN COMPOSITION CONSTITUTING SAME, AND DISPLAY DEVICE 주식회사 동진쎄미켐 2024-02-01 WO disclosed
CN-107463067-B Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2024-01-26 CN disclosed
CN-117402172-A Synthesis method of 3, 6-bis (trifluoromethyl) -pyromellitic dianhydride 中国科学院上海有机化学研究所 2024-01-16 CN disclosed
CN-117402172-A Synthesis method of 3, 6-bis (trifluoromethyl) -pyromellitic dianhydride 中国科学院上海有机化学研究所 2024-01-16 CN disclosed
US-4792476-A AROMATIC POLYIMIDES HITACHI, LTD. (JP) 1988-12-20 US disclosed
US-4735492-A POLYIMIDE-ISOIDOLOQUINAZOLINEDIONE HITACHI CHEMICAL COMPANY, LTD. (JP) 1988-04-05 US disclosed
US-4690999-A MOLECULARLY-ORIENTED POLYIMIDES BASED ON PARA-AROMATIC DIAMINES; FILMS; PROTECTIVE COATINGS; INTEGRATED CIRCUITS HITACHI, LTD. (JP) 1987-09-01 US disclosed
EP-0219336-A2 Liquid crystal orientation controlling film and liquid crystal device using the same Hitachi Chemical Co., Ltd. (JP) 1987-04-22 EP disclosed
EP-0133533-A2 Low thermal expansion resin material for a wiring insulating film. HITACHI, LTD. (JP) 1985-02-27 EP disclosed