SCHEMBL4366769

SCHEMBL4366769

CC(C)=COC=C(C)C.CC(CO)CCO

nearest known ligand 0.47

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.47
ALOX15 P16050 1/20 0.47
TSHR P16473 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4364058 0.91 ALOX15 (0.56) ALDH1A1ALOX15TSHR
SCHEMBL4368222 0.86 TSHR (0.42) ALDH1A1ALOX15TSHR
1,3-Butanediol SCHEMBL4368561 0.80 ALDH1A1 (0.39) ALDH1A1ALOX15
SCHEMBL4371992 0.79 TSHR (0.43) ALDH1A1ALOX15TSHR
SCHEMBL794539 0.78
SCHEMBL111181 0.78
SCHEMBL2499904 0.78
Methoxymethane SCHEMBL9576631 0.76 TSHR (0.52) ALDH1A1ALOX15TSHR
Methyl Alcohol SCHEMBL25212727 0.75
Ammonia Solution, Strong SCHEMBL28590964 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090035696-A1 PHOTORESIST COMPOSITION KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed