Hydroquinone

Hydroquinone

SCHEMBL4368343

CCC(=COC=C(CC)CC)CC.Oc1ccc(O)cc1

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.44
ESR2 Q92731 6/20 0.44
CYP3A4 P08684 4/20 0.44
LMNA P02545 3/20 0.44
MAPT P10636 3/20 0.44
ALOX15 P16050 3/20 0.44
HSD17B10 Q99714 3/20 0.44
AR P10275 3/20 0.44
SLC6A2 P23975 3/20 0.44
SLC6A3 Q01959 3/20 0.44
ALDH1A1 P00352 3/20 0.44
KMT2A Q03164 3/20 0.44
MEN1 O00255 2/20 0.44
HIF1A Q16665 2/20 0.44
CYP1A2 P05177 2/20 0.44
PGR P06401 2/20 0.44
CHRM2 P08172 2/20 0.44
ADORA3 P0DMS8 2/20 0.44
CYP2D6 P10635 2/20 0.44
CHRM1 P11229 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydroquinone SCHEMBL4371205 0.84 HSD17B3 (0.46) ESR1ESR2CYP3A4LMNAHSD17B10
Resorcinol SCHEMBL4365833 0.83 ALDH1A1 (0.48) CYP3A4LMNAHSD17B10ALDH1A1DRD1
SCHEMBL540179 0.82
Hydroquinone SCHEMBL4371379 0.72 MAPT (0.44) ESR1ESR2CYP3A4LMNAMAPT
Hydroquinone SCHEMBL6071932 0.69 LMNA (0.67) ESR1ESR2CYP3A4LMNAMAPT
Hydroquinone SCHEMBL11180188 0.69 LMNA (0.67) ESR1ESR2CYP3A4LMNAMAPT
Hydroquinone SCHEMBL3095350 0.69 LMNA (0.67) ESR1ESR2CYP3A4LMNAMAPT
1,6-Hexanediol SCHEMBL4367823 0.68 LMNA (0.43) LMNAHSD17B10ALDH1A1KMT2AMEN1
SCHEMBL4366491 0.68 LMNA (0.43) LMNAHSD17B10ALDH1A1KMT2AMEN1
SCHEMBL4367813 0.68 LMNA (0.43) LMNAHSD17B10ALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090035696-A1 PHOTORESIST COMPOSITION KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed