Hydroquinone

Hydroquinone

SCHEMBL4371205

CCCCC(=COC=C(CC)CCCC)CC.Oc1ccc(O)cc1

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B3 P37058 7/20 0.46
ESR1 P03372 7/20 0.44
ESR2 Q92731 2/20 0.44
MIF P14174 1/20 0.43
LTA4H P09960 2/20 0.42
NR5A1 Q13285 1/20 0.42
ADRA2A P08913 2/20 0.40
ADORA3 P0DMS8 2/20 0.40
TACR2 P21452 2/20 0.40
SLC6A2 P23975 2/20 0.40
SLC6A4 P31645 2/20 0.40
SLC6A3 Q01959 2/20 0.40
LMNA P02545 2/20 0.40
KDM4E B2RXH2 1/20 0.40
ALDH1A1 P00352 1/20 0.40
SHBG P04278 1/20 0.40
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40
HSPD1 P10809 1/20 0.40
ADRB3 P13945 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Resorcinol SCHEMBL4379606 0.86 CA12 (0.39) ESR1ESR2LMNAALDH1A1CYP3A4
SCHEMBL4376661 0.86 CES1 (0.36) ALDH1A1TP53
Catechol SCHEMBL4376198 0.86 IAPP (0.39) HSD17B3ESR1LMNAKDM4EALDH1A1
Hydroquinone SCHEMBL4368343 0.84 ESR1 (0.44) ESR1ESR2LTA4HNR5A1ADRA2A
1,4-Butanediol SCHEMBL4370220 0.79 SMN1; SMN2 (0.44) LMNAALDH1A1HSD17B10ACHETSHR
SCHEMBL1734341 0.78 CES2 (0.41) ESR1ALDH1A1HSD17B10TSHR
SCHEMBL7076114 0.77 CES1 (0.39) LMNAALDH1A1TP53TSHRSMN1; SMN2
1,6-Hexanediol SCHEMBL4369163 0.77 LMNA (0.46) LMNAKDM4EALDH1A1HSD17B10ACHE
1,5-Pentanediol SCHEMBL4371571 0.77 LMNA (0.46) LMNAKDM4EALDH1A1HSD17B10ACHE
SCHEMBL4367819 0.77 LMNA (0.46) LMNAKDM4EALDH1A1HSD17B10ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090035696-A1 PHOTORESIST COMPOSITION KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed