SCHEMBL4370686

SCHEMBL4370686

Oc1ccc(CCCc2ccc(O)cc2O)c(O)c1

nearest known ligand 0.81

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TYR P14679 6/20 0.81
ALOX5 P09917 2/20 0.70
MEN1 O00255 1/20 0.70
TP53 P04637 1/20 0.70
CYP3A4 P08684 1/20 0.70
MAPT P10636 1/20 0.70
ALOX15 P16050 1/20 0.70
TSHR P16473 1/20 0.70
HTT P42858 1/20 0.70
KMT2A Q03164 1/20 0.70
TDP1 Q9NUW8 1/20 0.70
ESR1 P03372 1/20 0.55
CYP19A1 P11511 1/20 0.55
ESR2 Q92731 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8398793 0.93 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL8401997 0.93 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL8398763 0.93 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL8401879 0.93 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL1397158 0.90 TYR (1.00) TYRALOX5MEN1TP53CYP3A4
SCHEMBL6822966 0.89 ESR1 (0.70) TYRALOX5MEN1TP53CYP3A4
SCHEMBL532243 0.89 TYR (0.71) TYRALOX5MEN1TP53CYP3A4
SCHEMBL30576432 0.88 TYR (0.79) TYRALOX5MEN1TP53CYP3A4
SCHEMBL14001444 0.88 TYR (0.67) TYRALOX5MEN1TP53CYP3A4
SCHEMBL1848148 0.88 TYR (0.79) TYRALOX5MEN1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
EP-1614005-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-01-11 EP claimed
US-6905809-B2 Photoresist compositions CLARIANT FINANCE (BVI) LIMITED (VG) 2005-06-14 US claimed
WO-2004088424-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-5880314-A DEPIGMENTING; SAFE TO SKIN, STORAGE STABLE MITSUI CHEMICALS, INC. (JP) 1999-03-09 US claimed
EP-0811595-A1 HYDROCHALCONE DERIVATIVES, COMESTIC COMPOSITIONS CONTAINING THE SAME, AND PROCESSES FOR THE PREPARATION OF BOTH MITSUI TOATSU CHEMICALS, Inc. (JP) 1997-12-10 EP claimed
JP-11310528-A None JP disclosed
JP-9221439-A None JP disclosed
US-12631965-B2 Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film ECHEM SOLUTIONS CORP. (TW) 2026-05-19 US disclosed
US-20250376552-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2025-12-11 US disclosed
US-20250362597-A1 RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-27 US disclosed
US-5945516-A PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1999-08-31 US disclosed
US-5880314-A DEPIGMENTING; SAFE TO SKIN, STORAGE STABLE MITSUI CHEMICALS, INC. (JP) 1999-03-09 US disclosed
US-5821345-A DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE SHIPLEY COMPANY, L.L.C. (US) 1998-10-13 US disclosed
EP-0811595-A1 HYDROCHALCONE DERIVATIVES, COMESTIC COMPOSITIONS CONTAINING THE SAME, AND PROCESSES FOR THE PREPARATION OF BOTH MITSUI TOATSU CHEMICALS, Inc. (JP) 1997-12-10 EP disclosed
JP-H09221439-A HYDROCHALCONE DERIVATIVE, COSMETIC CONTAINING THE SAME AND PRODUCTION THEREOF KANEBO LTD 1997-08-26 JP disclosed
US-5576139-A EXCELLENT RESOLUTION, SENSITIVITY, HEAT RESISTANCE AND DEVELOPABILITY FUJI PHOTO FILM CO., LTD. (JP) 1996-11-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12631965-B2 Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film PAH, POLR1A, CBR1 TYR 60/4885ALOX5 364/4885MEN1 4518/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.