Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.48 |
| ▸ | SMYD3 | Q9H7B4 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.46 |
| ▸ | MAPT | P10636 | 5/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.45 |
| ▸ | HPGD | P15428 | 3/20 | 0.45 |
| ▸ | RECQL | P46063 | 3/20 | 0.45 |
| ▸ | POLB | P06746 | 3/20 | 0.45 |
| ▸ | GAA | P10253 | 3/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | MITF | O75030 | 1/20 | 0.45 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | GFER | P55789 | 1/20 | 0.45 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.45 |
| ▸ | RELA | Q04206 | 1/20 | 0.45 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.45 |
| ▸ | KLF5 | Q13887 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6865178 | 0.94 | ALDH1A1 (0.54) | KDM4ESMYD3ALDH1A1HSD17B10CYP3A4 | |
| SCHEMBL9121653 | 0.94 | ALDH1A1 (0.54) | KDM4ESMYD3ALDH1A1HSD17B10CYP3A4 | |
| SCHEMBL29398350 | 0.94 | KDM4E (0.55) | KDM4ESMYD3ALDH1A1HSD17B10CYP3A4 | |
| SCHEMBL100233 | 0.94 | KDM4E (0.55) | KDM4ESMYD3ALDH1A1HSD17B10CYP3A4 | |
| SCHEMBL9119115 | 0.88 | PTPN1 (0.53) | KDM4ESMYD3ALDH1A1HSD17B10CYP3A4 | |
| SCHEMBL28624473 | 0.87 | KDM4E (0.57) | KDM4ESMYD3ALDH1A1HSD17B10MAPT | |
| SCHEMBL28025 | 0.87 | KDM4E (0.59) | KDM4EALDH1A1HSD17B10MAPTTDP1 | |
| SCHEMBL29406959 | 0.87 | KDM4E (0.59) | KDM4EALDH1A1HSD17B10MAPTTDP1 | |
| Hydrochloric Acid SCHEMBL9088279 | 0.84 | KDM4E (0.57) | KDM4EALDH1A1HSD17B10MAPTTDP1 | |
| SCHEMBL8736492 | 0.84 | KDM4E (0.63) | KDM4EALDH1A1HSD17B10MAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 796 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | claimed |
| WO-2014004146-A1 | SILICONE RUBBER | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2014-01-03 | — | — | WO | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122029489-A | Photosensitive resin composition, cured product, display device, and electronic component | 东丽株式会社 | 2026-05-12 | — | — | CN | disclosed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4692937-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | Toray Industries, Inc. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260003274-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003281-A1 | RESIN COMPOSITION, DIAMINE COMPOUND, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2026-01-01 | — | — | US | disclosed |
| US-5594062-A | Polycarbonate/polyolefin based resin compositions and their production processes and uses | KAWASAKI STEEL CORPORATION (JP) | 1997-01-14 | — | — | US | disclosed |
| US-5491188-A | ADDING DIAMIDE COMPOUNDS AS NUCLEATING AGENT TO PROPYLENE HOMO-, CO- AND TERPOLYMERS; FILTRATION MEMBRANES, PRINTING SHEETS | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1996-02-13 | — | — | US | disclosed |
| EP-0673949-A1 | Compatibilized polycarbonate/polyolefin resin compositions | KAWASAKI STEEL CORPORATION (JP) | 1995-09-27 | — | — | EP | disclosed |
| US-5391699-A | Containing an aromatic amine carboxylate, heat resistance | BRIDGESTONE CORPORATION (JP) | 1995-02-21 | — | — | US | disclosed |
| CN-1098725-A | Based on porous stretched article of acrylic resin and preparation method thereof | NEW JAPAN CHEM CO LTD (JP) | 1995-02-15 | — | — | CN | disclosed |
| EP-0632095-A2 | Porous stretched article of polypropylene-based resin and process for its preparation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1995-01-04 | — | — | EP | disclosed |
| EP-0571095-A2 | Polyester copolymer and process for the production of the same | BRIDGESTONE CORPORATION (JP) | 1993-11-24 | — | — | EP | disclosed |
| EP-0557721-A2 | Crystalline polypropylene resin composition and amide compounds | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |
| US-3996201-A | MOLDING | CIBA-GEIGY CORPORATION (US) | 1976-12-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | KDM4E 88/4885SMYD3 2964/4885ALDH1A1 3706/4885 |
| US-20260003281-A1 | RESIN COMPOSITION, DIAMINE COMPOUND, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | SEM1, SAT1, ASIC1 | KDM4E 49/4885SMYD3 2156/4885ALDH1A1 50/4885 |
| US-20260003274-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | SEM1, ASIC1, SMARCB1 | KDM4E 549/4885SMYD3 1031/4885ALDH1A1 1444/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | KDM4E 184/4885SMYD3 2393/4885ALDH1A1 3281/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.