⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4977348 | 0.79 | POLB (0.30) | — | |
| SCHEMBL5192085 | 0.76 | CHRM2 (0.34) | — | |
| Trifluoroacetic Acid SCHEMBL3183770 | 0.76 | TET2 (0.38) | — | |
| SCHEMBL203037 | 0.76 | — | — | |
| Methacrylic Acid SCHEMBL372591 | 0.75 | TDP1 (0.34) | — | |
| Methacrylic Acid SCHEMBL18342808 | 0.75 | TDP1 (0.34) | — | |
| Methacrylic Acid SCHEMBL20873030 | 0.74 | POLB (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL25206010 | 0.73 | TET2 (0.34) | — | |
| SCHEMBL8586407 | 0.73 | TET2 (0.34) | — | |
| Hydrochloric Acid SCHEMBL953095 | 0.73 | TET2 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150185616-A1 | RESISTS FOR LITHOGRAPHY | PIXELLIGENT TECHNOLOGIES, LLC | 2015-07-02 | — | — | US | disclosed |
| US-20130136897-A1 | RESISTS FOR LITHOGRAPHY | PIXELLIGENT TECHNOLOGIES, LLC (US) | 2013-05-30 | — | — | US | disclosed |
| US-8383316-B2 | Multi-step; reversible; provide exposure quadratically dependant on intensity of light; semiconductors | PIXELLIGENT TECHNOLOGIES, LLC (US) | 2013-02-26 | — | — | US | disclosed |
| EP-2047332-A2 | RESISTS FOR PHOTOLITHOGRAPHY | Pixelligent Technologies LLC, (US) | 2009-04-15 | — | — | EP | disclosed |
| US-20080176166-A1 | RESISTS FOR LITHOGRAPHY | PIXELLIGENT TECHNOLOGIES, LLC | 2008-07-24 | — | — | US | disclosed |
| WO-2008008275-A2 | RESISTS FOR PHOTOLITHOGRAPHY | PIXELLIGENT TECHNOLOGIES LLC (US) | 2008-01-17 | — | — | WO | disclosed |