Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL372591 | 0.82 | TDP1 (0.34) | POLBAPEX1TDP1 | |
| Methacrylic Acid SCHEMBL18342808 | 0.82 | TDP1 (0.34) | POLBAPEX1TDP1 | |
| Methacrylic Acid SCHEMBL20873030 | 0.80 | POLB (0.33) | POLBAPEX1TDP1 | |
| Bicarbonate SCHEMBL4270205 | 0.80 | POLB (0.38) | POLBAPEX1TDP1 | |
| Bicarbonate SCHEMBL976297 | 0.80 | POLB (0.38) | POLBAPEX1TDP1 | |
| SCHEMBL2701619 | 0.80 | — | — | |
| SCHEMBL4856069 | 0.80 | — | — | |
| SCHEMBL4371659 | 0.79 | — | — | |
| SCHEMBL17870825 | 0.77 | — | — | |
| Acetic Acid SCHEMBL539228 | 0.75 | POLB (0.40) | POLBAPEX1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1778759-B1 | PHOTOSENSITIVE DIELECTRIC RESIN COMPOSITIONS AND THEIR USES | PROMERUS LLC (US) | 2008-11-12 | — | — | EP | disclosed |
| US-6548219-B2 | Transparent to deep ultraviolet (DUV) radiation | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-04-15 | — | — | US | disclosed |
| US-6548219-B2 | Transparent to deep ultraviolet (DUV) radiation | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-04-15 | — | — | US | disclosed |
| US-6509134-B2 | Used to generate resist images; in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-21 | — | — | US | disclosed |
| US-6509134-B2 | Used to generate resist images; in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-21 | — | — | US | disclosed |
| US-6509134-B2 | Used to generate resist images; in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-21 | — | — | US | disclosed |
| US-20020146638-A1 | Norbornene fluoroacrylate copolymers and process for use thereof | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020146638-A1 | Norbornene fluoroacrylate copolymers and process for use thereof | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020146638-A1 | Norbornene fluoroacrylate copolymers and process for use thereof | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020102490-A1 | Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions | GLOBALFOUNDRIES U.S. INC. | 2002-08-01 | — | — | US | disclosed |
| US-20020102490-A1 | Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions | GLOBALFOUNDRIES U.S. INC. | 2002-08-01 | — | — | US | disclosed |