Phenol

Phenol

SCHEMBL437384

C1=CC([Zr+2]2(C3C=Cc4ccccc43)CC2)c2ccccc21.[O-]c1ccccc1.[O-]c1ccccc1

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 1/20 0.34
SIGMAR1 Q99720 2/20 0.32
HTR2A P28223 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL4436632 1.00 HTR6 (0.34) HTR6SIGMAR1HTR2A
SCHEMBL6357318 0.88 HTR2A (0.33) HTR6SIGMAR1HTR2A
SCHEMBL5839790 0.88 HTR2A (0.35) HTR6HTR2A
Hydrochloric Acid SCHEMBL151866 0.88 HTR2A (0.35) HTR6HTR2A
Hydrochloric Acid SCHEMBL648408 0.88 HTR2A (0.35) HTR6HTR2A
Bromide SCHEMBL616105 0.88 HTR2A (0.39) HTR6HTR2A
Fluoride Ion SCHEMBL1130929 0.88 HTR2A (0.35) HTR6HTR2A
Hydrochloric Acid SCHEMBL8017987 0.86 HTR6 (0.33) HTR6SIGMAR1HTR2A
Hydrochloric Acid SCHEMBL7190324 0.86 HTR2A (0.34) HTR6HTR2A
Phenol SCHEMBL9986757 0.83 RARA (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240109923-A1 TRANSITION METAL COMPOUND AND CATALYST COMPOSITION COMPRISING THE SAME LG CHEM, LTD. (KR) 2024-04-04 US disclosed
US-11643533-B2 Film, method of producing film, and bag SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-09 US disclosed
EP-4116369-A1 ETHYLENE-BASED MODIFIER, ETHYLENE-BASED RESIN COMPOSITION, FILM, METHOD FOR PRODUCING ETHYLENE-BASED RESIN COMPOSITION, AND METHOD FOR PRODUCING FILM SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-01-11 EP disclosed
US-11149102-B2 Film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-19 US disclosed
US-20210284829-A1 FILM, METHOD OF PRODUCING FILM, AND BAG SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-09-16 US disclosed
EP-3878896-A1 FILM, METHOD OF PRODUCING FILM, AND BAG SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2021-09-15 EP disclosed
EP-3816198-A1 ETHYLENE-ALPHA-OLEFIN COPOLYMER, METHOD OF PRODUCING ETHYLENE-ALPHA-OLEFIN COPOLYMER, ETHYLENE-BASED RESIN COMPOSITION, AND FILM SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2021-05-05 EP disclosed
US-20210122854-A1 ETHYLENE-alpha-OLEFIN COPOLYMER, METHOD OF PRODUCING ETHYLENE-alpha-OLEFIN COPOLYMER, ETHYLENE-BASED RESIN COMPOSITION, AND FILM SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-04-29 US disclosed
US-9919300-B2 1-hexene production process SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-03-20 US disclosed
EP-2484685-B1 TRANSITION METAL COMPLEX, PREPARATION METHOD FOR SAID TRANSITION METAL COMPLEX, TRIMERIZATION CATALYST, PREPARATION METHOD FOR 1-HEXENE, PREPARATION METHOD FOR ETHYLENE POLYMER, SUBSTITUTED CYCLOPENTADIENE COMPOUND, AND PREPARATION METHOD FOR SAID SUBSTITUTED CYCLOPENTADIENE COMPOUND SUMITOMO CHEMICAL CO (JP) 2017-11-01 EP disclosed
US-20050222351-A1 Process for producing compound, catalyst component for addition polymerization, process for producing catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED 2005-10-06 US disclosed
US-20050148459-A1 Process for producing modified particle, carrier or catalyst component for addition polymerization, pre-polymerized catalyst component therefor, catalyst therefor, and addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED 2005-07-07 US disclosed
US-20050098927-A1 Method for producing an extruded molded article of ethylene polymer and the film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-12 US disclosed
US-20040249101-A1 Ethylene copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-12-09 US disclosed
EP-0834514-B1 Process for synthesizing metallocene compounds KANTO KAGAKU (JP) 2003-10-22 EP disclosed
US-20030069127-A1 Modified particle,support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMTED (JP) 2003-04-10 US disclosed
EP-1275662-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-01-15 EP disclosed
JP-2003012682-A ZIRCONIUM COMPOUND, METHOD FOR PRODUCING THE SAME AND USE THEREOF SUMITOMO CHEM CO LTD 2003-01-15 JP disclosed
US-5892075-A Process for synthesizing metallocene compounds KANTO KAGAKU KABUSHIKI KAISHA (JP) 1999-04-06 US disclosed
EP-0834514-A2 Process for synthesizing metallocene compounds KANTO KAGAKU KABUSHIKI KAISHA (JP) 1998-04-08 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050222351-A1 Process for producing compound, catalyst component for addition polymerization, process for producing catalyst for addition polymerization, and process for producing addition polymer CCNT1, C5, C9 HTR6 2787/4885SIGMAR1 4476/4885HTR2A 2998/4885
US-20240109923-A1 TRANSITION METAL COMPOUND AND CATALYST COMPOSITION COMPRISING THE SAME PCNA, EMG1, TAF1 HTR6 4332/4885SIGMAR1 4176/4885HTR2A 4753/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.