SCHEMBL4376340

SCHEMBL4376340

CC(C)(C)OC(=O)CCC(C)(c1ccc(OC2CCCCO2)cc1)c1ccc(OC2CCCCO2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 1/20 0.36
HSD11B1 P28845 1/20 0.35
ESR1 P03372 1/20 0.35
CYP3A4 P08684 1/20 0.35
ESR2 Q92731 1/20 0.35
NPY1R P25929 1/20 0.34
NPY2R P49146 1/20 0.34
NPY4R P50391 1/20 0.34
NPY5R Q15761 1/20 0.34
SMN1; SMN2 Q16637 3/20 0.33
LMNA P02545 1/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
HPGD P15428 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
TNK2 Q07912 3/20 0.32
PTPN1 P18031 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4378071 0.97 ALDH1A1 (0.39) MEN1KMT2AALDH1A1KDM4EESR1
SCHEMBL13588053 0.90 KMT2A (0.39) MEN1KMT2AALDH1A1KDM4EHSD11B1
SCHEMBL3831284 0.79 MEN1 (0.40) MEN1KMT2AALDH1A1KDM4EHSD11B1
SCHEMBL14646596 0.75 NPY1R (0.44) MEN1KMT2AALDH1A1KDM4EHSD11B1
SCHEMBL197925 0.75 ALDH1A1 (0.45) MEN1KMT2AALDH1A1KDM4EESR1
SCHEMBL4382295 0.74 MEN1 (0.45) MEN1KMT2AALDH1A1KDM4EHSD11B1
SCHEMBL7231933 0.74 NPY1R (0.54) MEN1KMT2AALDH1A1KDM4EHSD11B1
SCHEMBL1457107 0.74 NPY1R (0.43) MEN1KMT2AALDH1A1KDM4EHSD11B1
SCHEMBL28450438 0.74 HPGD (0.44) MEN1KMT2AALDH1A1NPC1RAB9A
SCHEMBL7188322 0.73 ALDH1A1 (0.38) MEN1KMT2AALDH1A1KDM4EHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090075482-A1 PROCESS FOR FORMING A PATTERN INCLUDING ON A SEMICONDUCTOR DEVICE NEC ELECTRONICS CORPORATION (JP) 2009-03-19 US disclosed
US-7479361-B2 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process NEC ELECTRONICS CORPORATION (JP) 2009-01-20 US disclosed
US-20040259373-A1 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process NEC ELECTRONICS CORPORATION (JP) 2004-12-23 US disclosed