SCHEMBL4378071

SCHEMBL4378071

CC(C)(C)OC(=O)CCC(C)(c1ccc(OC2CCCO2)cc1)c1ccc(OC2CCCO2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
ESR1 P03372 1/20 0.35
CYP3A4 P08684 1/20 0.35
ESR2 Q92731 1/20 0.35
SMN1; SMN2 Q16637 4/20 0.35
HPGD P15428 4/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
LMNA P02545 3/20 0.34
PDE4B Q07343 1/20 0.33
CTSD P07339 1/20 0.33
BACE1 P56817 1/20 0.33
NPY1R P25929 1/20 0.33
NPY2R P49146 1/20 0.33
NPY4R P50391 1/20 0.33
NPY5R Q15761 1/20 0.33
ALOX12 P18054 1/20 0.32
NPC1 O15118 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4376340 0.97 MEN1 (0.41) ALDH1A1KDM4EMEN1KMT2AESR1
SCHEMBL13588053 0.86 KMT2A (0.39) ALDH1A1KDM4EMEN1KMT2AESR1
SCHEMBL7188322 0.77 ALDH1A1 (0.38) ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2
SCHEMBL197925 0.76 ALDH1A1 (0.45) ALDH1A1KDM4EMEN1KMT2AESR1
SCHEMBL3831284 0.75 MEN1 (0.40) ALDH1A1KDM4EMEN1KMT2ACYP3A4
SCHEMBL8424914 0.74 ALDH1A1 (0.41) ALDH1A1KDM4EKMT2AESR1CYP3A4
SCHEMBL4376347 0.74 HPGD (0.46) ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2
SCHEMBL196300 0.73 PSEN1 (0.46) ALDH1A1MEN1KMT2AESR1CYP3A4
SCHEMBL196285 0.73 ELANE (0.54) ALDH1A1KDM4EKMT2AESR1CYP3A4
SCHEMBL7120567 0.73 ALDH1A1 (0.40) ALDH1A1KDM4EMEN1KMT2AESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090075482-A1 PROCESS FOR FORMING A PATTERN INCLUDING ON A SEMICONDUCTOR DEVICE NEC ELECTRONICS CORPORATION (JP) 2009-03-19 US disclosed
US-7479361-B2 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process NEC ELECTRONICS CORPORATION (JP) 2009-01-20 US disclosed
US-20040259373-A1 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process NEC ELECTRONICS CORPORATION (JP) 2004-12-23 US disclosed