SCHEMBL438130

SCHEMBL438130

CC=COC(C)CCc1ccc(N(C)C)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 2/20 0.41
ALDH1A1 P00352 4/20 0.40
MAPK1 P28482 2/20 0.40
TSHR P16473 2/20 0.40
CYP3A4 P08684 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.36
CHKA P35790 3/20 0.35
ALOX15 P16050 1/20 0.34
HSD17B10 Q99714 1/20 0.34
APP P05067 3/20 0.33
HRH3 Q9Y5N1 2/20 0.33
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA9 Q16790 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL435791 0.85 LMNA (0.40) ALDH1A1MAPK1TSHRCYP3A4TDP1
SCHEMBL436835 0.84 ALDH1A1 (0.42) CALM1ALDH1A1MAPK1TSHRCYP3A4
SCHEMBL13886433 0.74 ALDH1A1 (0.54) CALM1ALDH1A1MAPK1TSHRCYP3A4
SCHEMBL435293 0.71 SLC2A1 (0.42) ALDH1A1MAPK1TSHRCYP3A4TDP1
SCHEMBL435292 0.71 SLC2A1 (0.42) ALDH1A1MAPK1TSHRCYP3A4TDP1
SCHEMBL434882 0.69 MEN1 (0.43) ALDH1A1MAPK1TSHRCYP3A4TDP1
SCHEMBL4405018 0.69 ALDH1A1 (0.70) CALM1ALDH1A1MAPK1TSHRCYP3A4
SCHEMBL3809194 0.68 ALDH1A1 (0.47) CALM1ALDH1A1MAPK1TSHRCYP3A4
SCHEMBL27459693 0.67 ALDH1A1 (0.45) CALM1ALDH1A1MAPK1TSHRCYP3A4
SCHEMBL27459335 0.67 ALDH1A1 (0.45) CALM1ALDH1A1MAPK1TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US claimed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US claimed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US claimed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US claimed
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US disclosed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US disclosed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US disclosed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US disclosed