Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DHFR | P00374 | 1/20 | 0.45 |
| ▸ | TNK2 | Q07912 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | HRH1 | P35367 | 1/20 | 0.41 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | LTA4H | P09960 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | ACP1 | P24666 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4381881 | 0.95 | HRH1 (0.41) | DHFRTNK2MEN1KMT2AHRH1 | |
| SCHEMBL14949944 | 0.91 | DHFR (0.41) | DHFRTNK2MEN1KMT2AHRH1 | |
| SCHEMBL3500438 | 0.89 | TNK2 (0.44) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL7774639 | 0.87 | DDB1 (0.41) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL883393 | 0.87 | DHFR (0.41) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL3139148 | 0.87 | DHFR (0.46) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL5702480 | 0.87 | DDB1 (0.41) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL862862 | 0.87 | MEN1 (0.43) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL3394710 | 0.85 | MEN1 (0.42) | DHFRTNK2MEN1KMT2AKDM4C | |
| SCHEMBL24041815 | 0.84 | DHFR (0.40) | DHFRTNK2MEN1KMT2AKDM4C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1308782-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | claimed |
| EP-1378795-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-08-29 | — | — | EP | disclosed |
| US-20090075482-A1 | PROCESS FOR FORMING A PATTERN INCLUDING ON A SEMICONDUCTOR DEVICE | NEC ELECTRONICS CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7479361-B2 | Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process | NEC ELECTRONICS CORPORATION (JP) | 2009-01-20 | — | — | US | disclosed |
| US-6869748-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-20040259373-A1 | Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040023153-A1 | Resist compostion and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1378795-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20020115018-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |