Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | DHFR | P00374 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | TNK2 | Q07912 | 3/20 | 0.38 |
| ▸ | LTA4H | P09960 | 1/20 | 0.37 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | ICAM1 | P05362 | 1/20 | 0.35 |
| ▸ | SELE | P16581 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | FAAH | O00519 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | PPARG | P37231 | 1/20 | 0.35 |
| ▸ | PPARA | Q07869 | 1/20 | 0.35 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.35 |
| ▸ | P2RX3 | P56373 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11770956 | 0.88 | ALDH1A1 (0.41) | MEN1KMT2ADHFRALDH1A1TSHR | |
| SCHEMBL4381658 | 0.87 | DHFR (0.45) | MEN1KMT2ADHFRALDH1A1TSHR | |
| SCHEMBL3500438 | 0.86 | TNK2 (0.44) | MEN1KMT2ADHFRALDH1A1HSD11B1 | |
| SCHEMBL883393 | 0.84 | DHFR (0.41) | MEN1KMT2ADHFRALDH1A1TSHR | |
| SCHEMBL3139148 | 0.84 | DHFR (0.46) | MEN1KMT2ADHFRALDH1A1TSHR | |
| SCHEMBL7774639 | 0.84 | DDB1 (0.41) | MEN1KMT2ADHFRHSD11B1TNK2 | |
| SCHEMBL5145220 | 0.84 | DHFR (0.44) | MEN1KMT2ADHFRALDH1A1TSHR | |
| SCHEMBL5702480 | 0.84 | DDB1 (0.41) | MEN1KMT2ADHFRHSD11B1TNK2 | |
| SCHEMBL19755191 | 0.83 | DHFR (0.41) | MEN1KMT2ADHFRALDH1A1TSHR | |
| SCHEMBL3394710 | 0.83 | MEN1 (0.42) | MEN1KMT2ADHFRALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230004084-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-05 | — | — | US | disclosed |
| US-8143366-B2 | Aryl carbamate oligomers for hydrolyzable prodrugs and prodrugs comprising same | BIOCON LIMITED (IN) | 2012-03-27 | — | — | US | disclosed |
| US-8143366-B2 | Aryl carbamate oligomers for hydrolyzable prodrugs and prodrugs comprising same | BIOCON LIMITED (IN) | 2012-03-27 | — | — | US | disclosed |
| US-20100081782-A1 | ARYL CARBAMATE OLIGOMERS FOR HYDROLYZABLE PRODRUGS AND PRODRUGS COMPRISING SAME | EKWURIBE NNOCHIRI N | 2010-04-01 | — | — | US | disclosed |
| US-7625995-B2 | Aryl carbamate oligomers for hydrolyzable prodrugs and prodrugs comprising same | BIOCON LIMITED (IN) | 2009-12-01 | — | — | US | disclosed |
| US-7625995-B2 | Aryl carbamate oligomers for hydrolyzable prodrugs and prodrugs comprising same | BIOCON LIMITED (IN) | 2009-12-01 | — | — | US | disclosed |
| US-7425281-B2 | Liquid crystal compositions comprising an organogermanium compound and methods for using the same | DISPLAYTECH, INC. (US) | 2008-09-16 | — | — | US | disclosed |
| US-20080146778-A1 | ARYL CARBAMATE OLIGOMERS FOR HYDROLYZABLE PRODRUGS AND PRODRUGS COMPRISING SAME | BIOCON LIMITED (IN) | 2008-06-19 | — | — | US | disclosed |
| EP-0524250-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-27 | — | — | EP | disclosed |
| EP-0524187-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS. | DU PONT (US) | 1993-01-27 | — | — | EP | disclosed |
| US-5145764-A | Acrylic ester polymer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-08 | — | — | US | disclosed |
| US-5120633-A | Polymers with acid-labile ester/ether pendant groups and acid-generating photoinitiators; positives; printed circuits; resolution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-09 | — | — | US | disclosed |
| US-5077174-A | Aqueous development, stripping | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-31 | — | — | US | disclosed |
| WO-1991015808-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| WO-1991015807-A1 | RESIST MATERIAL WITH CARBAZOLE DIAZONIUM SALT ACID GENERATOR AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| WO-1991015810-A1 | RESIST MATERIAL AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| WO-1991015809-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| US-4985332-A | Resist material with carbazole diazonium salt acid generator and process for use | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230004084-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, H1-4 | MEN1 920/4885KMT2A 1366/4885DHFR 3340/4885 |
| US-20080146778-A1 | ARYL CARBAMATE OLIGOMERS FOR HYDROLYZABLE PRODRUGS AND PRODRUGS COMPRISING SAME | ALK, AOX1, OGFR | MEN1 4097/4885KMT2A 1543/4885DHFR 1213/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | MEN1 1103/4885KMT2A 2150/4885DHFR 1941/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.