SCHEMBL4383378

SCHEMBL4383378

C=Cc1c(C(=O)O)c(C(=O)O)cc2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
ALDH1A1 P00352 2/20 0.53
HPGD P15428 2/20 0.53
KDM4E B2RXH2 2/20 0.53
CYP1A2 P05177 2/20 0.53
GLA P06280 1/20 0.53
CYP2C19 P33261 1/20 0.53
HSD17B10 Q99714 1/20 0.53
CYP2D6 P10635 2/20 0.51
GPR35 Q9HC97 2/20 0.46
POLB P06746 1/20 0.46
ME2 P23368 1/20 0.46
ME1 P48163 1/20 0.46
ME3 Q16798 1/20 0.46
CDC25B P30305 3/20 0.45
RXFP1 Q9HBX9 1/20 0.45
NR4A1 P22736 1/20 0.44
NR4A2 P43354 1/20 0.44
NR4A3 Q92570 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16146645 0.87 MEN1 (0.58) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL28652 0.79 MEN1 (0.70) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL31401681 0.79 MEN1 (0.70) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL30354048 0.79 MEN1 (0.70) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL382465 0.78 WDR5 (0.59) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL9516045 0.78 ALDH1A1 (0.62) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL31214834 0.78 MEN1 (0.68) MEN1KMT2AALDH1A1HPGDKDM4E
SCHEMBL10417205 0.78 MEN1 (0.68) MEN1KMT2AALDH1A1HPGDKDM4E
Cesium SCHEMBL31214843 0.78 MEN1 (0.68) MEN1KMT2AALDH1A1HPGDKDM4E
Rubidium SCHEMBL31214990 0.78 MEN1 (0.68) MEN1KMT2AALDH1A1HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2981985-B1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY BREWER SCIENCE INC (US) 2021-03-10 EP claimed
EP-2981985-A1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY Brewer Science, Inc. (US) 2016-02-10 EP claimed
US-9123541-B2 Highly etch-resistant polymer block for use in block copolymers for directed self-assembly BREWER SCIENCE INC. (US) 2015-09-01 US claimed
WO-2014165530-A1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY BREWER SCIENCE INC. (US) 2014-10-09 WO claimed
US-20140299969-A1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY BREWER SCIENCE INC. (US) 2014-10-09 US claimed
EP-2981985-B1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY BREWER SCIENCE INC (US) 2021-03-10 EP disclosed
EP-3503165-B1 METHOD FOR FORMING A CHEMICAL GUIDING STRUCTURE ON A SUBSTRATE AND METHOD FOR CHEMO-EPITAXY COMMISSARIAT ENERGIE ATOMIQUE (FR) 2021-03-03 EP disclosed
US-10845705-B2 Method for forming a chemical guiding structure on a substrate and chemoepitaxy method COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) 2020-11-24 US disclosed
EP-3327472-B1 HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR KONICA MINOLTA INC (JP) 2019-10-30 EP disclosed
US-20190196336-A1 METHOD FOR FORMING A CHEMICAL GUIDING STRUCTURE ON A SUBSTRATE AND CHEMOEPITAXY METHOD COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) 2019-06-27 US disclosed
EP-3503165-A1 METHOD FOR FORMING A CHEMICAL GUIDING STRUCTURE ON A SUBSTRATE AND METHOD FOR CHEMO-EPITAXY Commissariat à l'Energie Atomique et aux Energies Alternatives (FR) 2019-06-26 EP disclosed
US-20180217311-A1 HOLOGRAPHIC OPTICAL ELEMENT AND METHOD FOR PRODUCING THE SAME Konica Minolta, Inc. (JP) 2018-08-02 US disclosed
EP-2981985-A1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY Brewer Science, Inc. (US) 2016-02-10 EP disclosed
US-9123541-B2 Highly etch-resistant polymer block for use in block copolymers for directed self-assembly BREWER SCIENCE INC. (US) 2015-09-01 US disclosed
WO-2014165530-A1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY BREWER SCIENCE INC. (US) 2014-10-09 WO disclosed
US-20140299969-A1 HIGHLY ETCH-RESISTANT POLYMER BLOCK FOR USE IN BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY BREWER SCIENCE INC. (US) 2014-10-09 US disclosed
US-20090246643-A1 PHOTOSENSITIVE COMPOSITION CONTAINING ORGANIC-ZIRCONIA COMPOSITE FINE PARTICLES NATIONAL UNIVERSITY CORPORATION THE UNIVERSITY OF ELECTRO-COMMUNICATIONS (JP) 2009-10-01 US disclosed
EP-2058702-A1 PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC-ZIRCONIA COMPOSITE MICROPARTICLE National University Corporation The University of Electro - Communications (JP) 2009-05-13 EP disclosed
EP-0645431-A2 Polyester/polyepoxide/rubber alloys THE GOODYEAR TIRE & RUBBER COMPANY (US) 1995-03-29 EP disclosed
US-5361818-A Polymer alloys from reaction of polyesters, polyepoxides and unvulcanized rubber, blended with natural and synthetic rubber ;pneumatic tires THE GOODYEAR TIRE & RUBBER COMPANY (US) 1994-11-08 US disclosed