Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | WDR5 | P61964 | 1/20 | 0.59 |
| ▸ | LDHA | P00338 | 1/20 | 0.58 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.53 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.53 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | MITF | O75030 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | KLF5 | Q13887 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | CDC25B | P30305 | 1/20 | 0.47 |
| ▸ | ERN1 | O75460 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547877 | 0.84 | WDR5 (0.61) | WDR5LDHANR4A1NR4A2NR4A3 | |
| SCHEMBL27457193 | 0.78 | PTPN1 (0.54) | KDM4EMEN1KMT2AMAPTTDP1 | |
| SCHEMBL4383378 | 0.78 | MEN1 (0.53) | WDR5LDHANR4A1NR4A2NR4A3 | |
| SCHEMBL332990 | 0.78 | CYP1A2 (0.50) | WDR5KDM4EMAPTALDH1A1HPGD | |
| Acrylic Acid SCHEMBL28745482 | 0.76 | WDR5 (0.56) | WDR5LDHANR4A1NR4A2NR4A3 | |
| Propene SCHEMBL27774593 | 0.76 | WDR5 (0.56) | WDR5LDHANR4A1NR4A2NR4A3 | |
| Acrylic Acid SCHEMBL27762972 | 0.76 | ERN1 (0.42) | WDR5LDHANR4A1NR4A2NR4A3 | |
| SCHEMBL4168177 | 0.76 | WDR5 (0.51) | WDR5LDHANR4A1NR4A2NR4A3 | |
| SCHEMBL10590856 | 0.76 | RRM1 (0.40) | WDR5LDHAMEN1KMT2AMAPT | |
| SCHEMBL895573 | 0.75 | WDR5 (1.00) | WDR5LDHANR4A1NR4A2NR4A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107203109-B | Toner and method for producing toner | 佳能株式会社 | 2020-12-01 | — | — | CN | disclosed |
| CN-107037700-B | Toner and image forming apparatus | 佳能株式会社 | 2020-09-04 | — | — | CN | disclosed |
| US-10551758-B2 | Toner | CANON KABUSHIKI KAISHA (JP) | 2020-02-04 | — | — | US | disclosed |
| US-20180329328-A1 | TONER | CANON KABUSHIKI KAISHA (JP) | 2018-11-15 | — | — | US | disclosed |
| US-20180211828-A1 | COMPOSITION FOR FORMING FILM FOR USE IN CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2018-07-26 | — | — | US | disclosed |
| US-9921501-B2 | Toner and process for producing toner | CANON KABUSHIKI KAISHA (JP) | 2018-03-20 | — | — | US | disclosed |
| US-9897932-B2 | Toner | CANON KABUSHIKI KAISHA (JP) | 2018-02-20 | — | — | US | disclosed |
| CN-107203109-A | The manufacture method of toner and toner | 佳能株式会社 | 2017-09-26 | — | — | CN | disclosed |
| US-20170269488-A1 | TONER AND PROCESS FOR PRODUCING TONER | CANON KABUSHIKI KAISHA (JP) | 2017-09-21 | — | — | US | disclosed |
| US-9733584-B2 | Toner | CANON KABUSHIKI KAISHA (JP) | 2017-08-15 | — | — | US | disclosed |
| US-20100203457-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100178617-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100178618-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20090081595-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | WDR5 86/4885LDHA 4294/4885NR4A1 2593/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.