Trimethylammonium

Trimethylammonium

SCHEMBL4385863

CN(C)C.O=S(=O)(O)c1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.47
SERPINE1 P05121 3/20 0.44
L3MBTL1 Q9Y468 2/20 0.42
ACP1 P24666 1/20 0.41
MAPT P10636 3/20 0.41
HDAC8 Q9BY41 1/20 0.40
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP13 P45452 1/20 0.40
LMNA P02545 1/20 0.39
POLB P06746 1/20 0.39
GAA P10253 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
KMT2A Q03164 1/20 0.39
TACR1 P25103 1/20 0.39
CNR1 P21554 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL109565 0.92 CES2 (0.54) CES2SERPINE1L3MBTL1ACP1MAPT
SCHEMBL21522543 0.90 CES2 (0.52) CES2SERPINE1L3MBTL1ACP1MAPT
SCHEMBL9617536 0.90 CES2 (0.52) CES2SERPINE1L3MBTL1ACP1MAPT
SCHEMBL21522647 0.90 CES2 (0.52) CES2SERPINE1L3MBTL1ACP1MAPT
SCHEMBL21522570 0.90 CES2 (0.52) CES2SERPINE1L3MBTL1ACP1MAPT
Tetramethylammonium Ion SCHEMBL5493903 0.88 CES2 (0.47) CES2SERPINE1L3MBTL1ACP1MAPT
SCHEMBL2758458 0.82 CES2 (0.41) CES2ACP1MAPTCA1CA2
SCHEMBL3182026 0.80 CES2 (0.42) CES2L3MBTL1ACP1MAPTCA1
SCHEMBL11292063 0.78 ACP1 (0.49) CES2L3MBTL1ACP1MAPTCA1
SCHEMBL13277683 0.77 ACP1 (0.48) CES2L3MBTL1ACP1MAPTCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2477073-A1 Resist composition for electron beam, EUV or X-ray Fujifilm Corporation (JP) 2012-07-18 EP disclosed
US-7521168-B2 Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. FUJIFILM CORPORATION (JP) 2009-04-21 US disclosed
US-20030198894-A1 Resist composition for electron beam, EUV or X-ray FUJI PHOTO FILM CO., LTD. 2003-10-23 US disclosed
EP-1338921-A2 Resist composition for electron beam, X-ray or EUV Fuji Photo Film Co., Ltd. (JP) 2003-08-27 EP disclosed